由硅晶体绝缘基板制造的纳米机械结构
介观与纳米尺度物理
2025-05-08 v1 量子物理
摘要
我们描述了一种从硅晶体绝缘基板制作亚微米机械结构的方法。我们认为这是首个报道此类制造方法，该技术允许使用复杂的多层电子束光刻技术定义金属化层和结构硅层。绝缘下层可通过简单的湿法加工步骤去除，留下悬挂的单晶硅机械结构。我们制造并机械测试了包括梁共振器、调谐叉共振器和扭转振子在内的结构，最小尺寸为 0.1-0.2 微米，基本共振频率超过 10 MHz。
引用
@article{arxiv.2505.04574,
title = {Nanoscale Mechanical Structures Fabricated from Silicon-on-Insulator Substrates},
author = {Andrew N. Cleland and Michael L. Roukes},
journal= {arXiv preprint arXiv:2505.04574},
year = {2025}
}
备注
Submitted to Applied Physics Letters in 1996. Rejected by a single referee with the criticism that it was not a sufficient advance over our previous publication (on NEMS fabrication from bulk Si wafers) to warrant acceptance in APL. However, the method described herein has since become the standard fabrication method in the field of NEMS, and used worldwide over the past thirty years