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相关论文: Interface trap density metrology from sub-threshol…

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The presence of interface states at the MOS interface is a well-known cause of device degradation. This is particularly true for ultra-scaled FinFET geometries where the presence of a few traps can strongly influence device behavior.…

This paper discusses how classical transport theories such as the thermionic emission, can be used as a powerful tool for the study and the understanding of the most complex mechanisms of transport in Fin Field Effect Transistors (FinFETs).…

介观与纳米尺度物理 · 物理学 2011-11-28 G. C. Tettamanzi , A. Paul , S. Lee , G. Klimeck , S. Rogge

Thermally activated sub-threshold transport has been investigated in undoped triple gate MOSFETs. The evolution of the barrier height and of the active cross-section area of the channel as a function of gate voltage has been determined. The…

The effects of nitridation on the density of traps at SiO$_2$/SiC interfaces near the conduction band edge were qualitatively examined by a simple, newly developed characterization method that utilizes Hall effect measurements and split…

Randomly distributed traps at the MoS$_2$/SiO$_2$ interface result in non-ideal transport behavior, including hysteresis in MoS$_2$/SiO$_2$ field effect transistors (FETs). Thus traps are mostly detrimental to the FET performance but they…

介观与纳米尺度物理 · 物理学 2024-09-06 Santu Prasad Jana , Suraina Gupta , Anjan Kumar Gupta

Transport in InAs/GaSb heterostructures with different InAs layer thicknesses is studied using a six-terminal Hall bar geometry with a 2-$\mu$m edge channel length. For a sample with a 12-nm-thick InAs layer, non-local resistance…

介观与纳米尺度物理 · 物理学 2016-11-26 Kyoichi Suzuki , Yuichi Harada , Koji Onomitsu , Koji Muraki

Gate controllable electronic trap detection method has been demonstrated by regulating the gate potential of MIS devices. This method is based on shift of capacitance voltage (CV) curve as well as flatband voltage (VFB) measure in less than…

应用物理 · 物理学 2020-04-01 Sandip Mondal1 , Tathagata Paul , Arindam Ghosh , V. Venkataraman

Thin films of topological insulators (TI) usually exhibit multiple parallel conduction channels for the transport of electrical current. Beside the topologically protected surface states (TSS), parallel channels may exist, namely the…

介观与纳米尺度物理 · 物理学 2024-01-30 Sven Just , Felix Lüpke , Vasily Cherepanov , F. Stefan Tautz , Bert Voigtländer

A method for assessing the quality of electronic material properties of thin-film metal oxide semiconductor field-effect transistors (MOSFETs) is presented. By investigating samples with MOCVD-grown MoS${_2}$ channels exposed to atmospheric…

The spectral density of localized states in the band gap of pentacene (trap DOS) was determined with a pentacene-based thin-film transistor from measurements of the temperature dependence and gate-voltage dependence of the contact-corrected…

材料科学 · 物理学 2010-02-08 Wolfgang L. Kalb , Bertram Batlogg

We have developed and applied a mobility edge model that takes into account drift and diffusion currents to characterize the space charge limited current in organic semiconductors. The numerical solution of the drift-diffusion equation…

材料科学 · 物理学 2015-05-30 Javier Dacuña , Alberto Salleo

This letter reports on the design and demonstration of high-performance Beta-Ga2O3 FinFETs utilizing MOCVD-grown Si delta-doped channels to achieve enhanced carrier transport and electrostatic control. A record high sheet charge density of…

We have developed a technique that dramatically reduces the contact resistances and depletes a shunting channel between the contacts outside the Hall bar in ultra-high mobility SiGe/Si/SiGe heterostructures. It involves the creation of…

介观与纳米尺度物理 · 物理学 2024-10-10 M. Yu. Melnikov , A. A. Shashkin , S. -H. Huang , C. W. Liu , S. V. Kravchenko

We have measured the current-voltage (I-V) of type II InAs/GaSb/InAs double heterojunctions (DHETs) with 'GaAs like' interface bonding and GaSb thickness between 0-1200 \AA. A negative differential resistance (NDR) is observed for all DHETs…

介观与纳米尺度物理 · 物理学 2009-11-07 M. Roberts , Y. C. Chung , S. Lyapin , N. J. Mason , R. J. Nicholas , P. C. Klipstein

This paper presents the design and benchmarking of cryogenic bulk-FETs using an experimentally calibrated TCAD framework that integrates 2-D electrostatics and interface-trap effects from $T = 2$ K to 300 K. For a 28-nm node device, carrier…

应用物理 · 物理学 2025-12-03 Nilesh Pandey , Dipanjan Basu , Sanjay K. Banerjee

The effects of the oxidation atmosphere and crystal faces on the interface-trap density was examined by using constant-capacitance deep-level transient spectroscopy to clarify the origin of them. By comparing the DLTS spectra of the…

Thermal transport in high-electron-mobility-transistor (HEMT) structures grown on 4H-SiC substrates by metalorganic-vapour-phase epitaxy (MOCVD) is systematically investigated. The thermal conductivity of the GaN channel and AlN buffer…

材料科学 · 物理学 2025-10-15 Dat Q. Tran , Minho Kim , Okhyun Nam , Vanya Darakchieva , Plamen P. Paskov

We study impact of the near-interfacial oxide traps on the C-V and I-V characteristics of graphene gated structures. Methods of extraction of interface trap level density in graphene field effect devices from the capacitance-voltage…

介观与纳米尺度物理 · 物理学 2014-05-23 G. I. Zebrev , E. V. Melnik , A. A. Tselykovskiy

Disordered thin films close to the superconducting-insulating phase transition (SIT) hold the key to understanding quantum phase transition in strongly correlated materials. The SIT is governed by superconducting quantum fluctuations, which…

无序系统与神经网络 · 物理学 2018-03-14 David Dentelski , Aviad Frydman , Efrat Shimshoni , Emanuele G. Dalla Torre

We present transport measurements of silicon MOS split gate structures with and without Sb implants. We observe classical point contact (PC) behavior that is free of any pronounced unintentional resonances at liquid He temperatures. The…

介观与纳米尺度物理 · 物理学 2015-05-20 A. Shirkhorshidian , N. C. Bishop , J. Dominguez , R. K. Grubbs , J. R. Wendt , M. P. Lilly , M. S. Carroll
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