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相关论文: Side-gate leakage and field emission in all-graphe…

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In this paper, we have presented the impact of the gate leakage through thin gate dielectrics (SiO2 and high-\k{appa} gate dielectric) on the subthreshold characteristics of the tunnel field effect transistors (TFET) for a low operating…

介观与纳米尺度物理 · 物理学 2014-06-06 Poornendu Chaturvedi , M. Jagadesh Kumar

Graphene field-effect transistors are widely used for development of biosensors. However, certain fundamental questions about details of their functioning are not fully understood yet. One of these questions is the presence of gate…

介观与纳米尺度物理 · 物理学 2022-06-14 A. Svetlova , D. Kireev , D. Mayer , A. Offenhaeusser

Gate-All-Around Field-Effect Transistors (GAAFETs), now entering high-volume production as successors to fin field-effect transistor technology, are enabling continued scaling and enhanced performance in advanced semiconductor nodes.…

其他凝聚态物理 · 物理学 2026-03-24 Juan P. Mendez , Coleman Cariker , Michael Titze , Alex A. Belianinov , Denis Mamaluy

Substrate plays a crucial role in determining transport and low frequency noise behavior of graphene field effect devices. Typically, heavily dope Si/SiO$_2$ substrate is used to fabricate these devices for efficient gating.…

介观与纳米尺度物理 · 物理学 2022-10-19 Shubhadip Moulick , Rafiqul Alam , Atindra Nath Pal

We demonstrate ambipolar graphene field effect transistors individually controlled by local metal side gates. The side gated field effect can have on/off ratio comparable with that of the global back gate, and can be tuned in a large range…

介观与纳米尺度物理 · 物理学 2010-08-10 Jifa Tian , Luis A. Jauregui , Gabriel Lopez , Helin Cao , Yong P. Chen

We report the observation and characterization of field emission current from individual single- and few-layer graphene flakes laid on a flat SiO2/Si substrate. Measurements were performed in a scanning electron microscope chamber equipped…

介观与纳米尺度物理 · 物理学 2012-10-10 S. Santandrea , F. Giubileo , V. Grossi , S. Santucci , M. Passacantando , T. Schroeder , G. Lupina , A. Di Bartolomeo

Graphene field-effect transistors are integrated with solution-processed multilayer hybrid organic-inorganic self-assembled nanodielectrics (SANDs). The resulting devices exhibit low-operating voltage (2 V), negligible hysteresis, current…

We report results of experimental investigation of the low-frequency noise in the top-gate graphene transistors. The back-gate graphene devices were modified via addition of the top gate separated by 20 nm of HfO2 from the single-layer…

材料科学 · 物理学 2015-05-14 G. Liu , W. Stillman , S. Rumyantsev , Q. Shao , M. Shur , A. A. Balandin

We demonstrate top-gated field effect transistor made of reduced graphene oxide (RGO) monolayer (graphene) by dielectrophoresis. Raman spectrum of RGO flakes of typical size of 5{\mu}m x 5{\mu}m show a single 2D band at 2687 cm-1,…

介观与纳米尺度物理 · 物理学 2015-05-19 K. S. Vasu , Biswanath Chakraborty , S. Sampath , A. K. Sood

High frequency performance limits of graphene field-effect transistors (FETs) down to a channel length of 20nm are examined by using self-consistent quantum simulations. The results indicate that although Klein band-to-band tunneling is…

介观与纳米尺度物理 · 物理学 2011-02-09 Jyotsna Chauhan , Jing Guo

We report on "graphene-like" mechanical exfoliation of thin films of titanium ditelluride and investigation of their electronic properties. The exfoliated crystalline TiTe2 films were used as the channel layers in the back-gated…

介观与纳米尺度物理 · 物理学 2015-06-03 J. Khan , C. M. Nolen , D. Teweldebrhan , D. Wickramaratne , R. K. Lake , A. A. Balandin

We report the first observation of gate-controlled field emission current from a tungsten diselenide (WSe2) monolayer, synthesized by chemical-vapour deposition on SiO2/Si substrate. Ni contacted WSe2 monolayer back-gated transistors, under…

Top-gated, few-layer graphene field-effect transistors (FETs) fabricated on thermally-decomposed semi-insulating 4H-SiC substrates are demonstrated. Physical vapor deposited SiO2 is used as the gate dielectric. A two-dimensional hexagonal…

介观与纳米尺度物理 · 物理学 2009-11-13 Y. Q. Wu , P. D. Ye , M. A. Capano , Y. Xuan , Y. Sui , M. Qi , J. A. Cooper

We have fabricated and measured ballistic graphene transistors with two oblique gates that can be independently biased. The gate lengths are about 38 nm and are separated by a distance of 30 nm, the tilting angle being of 45o with respect…

介观与纳米尺度物理 · 物理学 2016-07-27 Mircea Dragoman , Adrian Dinescu , Daniela Dragoman

Graphene field effect transistors commonly comprise graphene flakes lying on SiO2 surfaces. The gate-voltage dependent conductance shows hysteresis depending on the gate sweeping rate/range. It is shown here that the transistors exhibit two…

介观与纳米尺度物理 · 物理学 2011-01-19 Haomin Wang , Yihong Wu , Chunxiao Cong , Jingzhi Shang , Ting Yu

Due to its high charge carrier mobility, broadband light absorption, and ultrafast carrier dynamics, graphene is a promising material for the development of high-performance photodetectors. Graphene-based photodetectors have been…

介观与纳米尺度物理 · 物理学 2015-02-25 Biddut K. Sarker , Isaac Childres , Edward Cazalas , Igor Jovanovic , Yong P. Chen

This letter investigates the bias-dependent low frequency noise of single layer graphene field-effect transistors. Noise measurements have been conducted with electrolyte-gated graphene transistors covering a wide range of gate and drain…

介观与纳米尺度物理 · 物理学 2018-10-22 Nikolaos Mavredakis , Ramon Garcia Cortadella , Andrea Bonaccini Calia , Jose A. Garrido , David Jiménez

Superconductivity can be induced in a normal material via the leakage of superconducting pairs of charge carriers from an adjacent superconductor. This so-called proximity effect is markedly influenced by graphene unique electronic…

Monolayer molybdenum disulfide (MoS$_2$) nanosheets, obtained via chemical vapor deposition onto SiO$_2$/Si substrates, are exploited to fabricate field-effect transistors with n-type conduction, high on/off ratio, steep subthreshold slope…

In this manuscript, we present a field effect transistor with a channel consisting of a two-dimensional electron gas located at the interface between an ultrathin metallic film of Ni and a p-type Si(111) substrate. We have demonstrated that…

介观与纳米尺度物理 · 物理学 2015-06-04 M. Dragoman , G. Konstantinidis , K. Tsagaraki , T. Kostopoulos , D. Dragoman , D. Neculoiu
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