相关论文: Exploring the electron density in plasmas induced …
We measured for the first time the electron density in an Extreme Ultra-Violet induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density…
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the…
We report the first direct demonstration of possibility to generate the extreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasma with multiply-charged ions supported by high-power microwaves. The detected emission…
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy…
We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a…
The radiation pressure of next generation ultra-high intensity ($>10^{23}$ W/cm$^{2}$) lasers could efficiently accelerate ions to GeV energies. However, nonlinear quantum-electrodynamic effects play an important role in the interaction of…
A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…
We investigate the carrier-envelope phase and intensity dependence of the longitudinal momentum distribution of photoelectrons resulting from above-threshold ionization of argon by few-cycle laser pulses. The intensity of the pulses with a…
Extreme ultraviolet (EUV) induced pulsed plasma is unique due to its transient characteristics: the plasma switches between non-thermal state (when EUV power is ON at the beginning of the pulse) and thermal state (end of the pulse at ~ 20…
The extreme ultraviolet plasma emission from liquid microsized argon droplets exposed to intense near-infrared laser pulses has been investigated. Emission from the warm dense matter targets is recorded in a spectral range in between 16 and…
We explore the interactions between Argon and extreme ultraviolet (XUV) laser pulses across photon energies of 200 eV, 260 eV, and 315 eV, scrutinizing the influence of photon energy on Argon ion yields and unraveling the associated…
An extreme ultraviolet (EUV) single attosecond pulse passing through a laser-dressed dense gas is studied theoretically. The weak EUV pulse pumps the helium gas from the ground state to the 2s2p(1P) autoionizing state, which is coupled to…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is…
Pulses of extreme ultraviolet (XUV) light, with wavelengths between 10 and 100$\,$nm, can be used to image and excite ultra-fast phenomena such as the motion of atomic electrons. Here we show that the illumination of plasma with…
We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave…
An influence of a high-voltage (3-17 kV) 20 ns pulse on a weakly-ionized low-pressure (0.1-10 Pa) capacitively-coupled radiofrequency (RF) argon plasma is studied experimentally. The plasma evolution after pulse exhibits two characteristic…
The ionization dynamic of argon plasma irradiated by an intense laser is investigated to understand transient physics in dynamic systems. This study demonstrates that significant delayed ionization responses and stepwise ionization…
A novel kind of electron beam sustained discharge is presented in which a 12keV electron beam is combined with a 2.45GHz microwave power to excite argon gas at atmospheric pressure in a continuous mode of operation. Optical emission…