基于微波支撑的稠密氙等离子体膨胀射流的极紫外光刻光源
等离子体物理
2018-10-03 v4 应用物理
摘要
我们讨论一种基于稠密氙等离子体（含多电荷离子）膨胀射流中的非平衡微波放电的极紫外(EUV)光点状光源的概念。我们计算了微波辐射到EUV光的转换效率，并考虑了物理限制及未来器件的机会。我们特别关注自发线发射在辐射等离子体光斑内的俘获，其显著影响EUV光源的效率。
引用
@article{arxiv.1712.10026,
title = {Extreme-ultraviolet light source for lithography based on an expanding jet of dense xenon plasma supported by microwaves},
author = {I. S. Abramov and E. D. Gospodchikov and A. G. Shalashov},
journal= {arXiv preprint arXiv:1712.10026},
year = {2018}
}
备注
This is an author-created version of an article published in Physical Review Applied