外延石墨烯与SiC衬底中的三重衍射对称性
材料科学
2011-07-04 v1
摘要
我们利用低能电子衍射（LEED）和低能电子显微镜（LEEM）中的暗场成像，研究了SiC上石墨烯薄膜的晶体学对称性和堆垛畴的空间分布。我们发现，来自2层和3层原子层石墨烯的石墨烯衍射斑具有三重对称性，这与层间的AB（Bernal）堆垛一致。相反，来自缓冲层和单层石墨烯的衍射斑则表现出明显的六重对称性，尽管卫星斑点的三重特性表明石墨烯片中具有更复杂的周期性。
引用
@article{arxiv.1107.0085,
title = {Three-Fold Diffraction Symmetry in Epitaxial Graphene and the SiC Substrate},
author = {David A. Siegel and Shuyun Zhou and Farid El Gabaly and Andreas K. Schmid and Kevin F. McCarty and Alessandra Lanzara},
journal= {arXiv preprint arXiv:1107.0085},
year = {2011}
}
备注
An addendum has been added for the arXiv version only, including one figure with five panels. Published paper can be found at http://link.aps.org/doi/10.1103/PhysRevB.80.241407