面向十层超导层与自分流约瑟夫森结的250纳米全平面化制备工艺进展
超导电性
2018-07-02 v1
摘要
我们正在开发一种超导电子制备工艺，具有多达九层平面化超导层、可堆叠柱状通孔、自分流 Nb/AlOx-Al/Nb 约瑟夫森结，以及一层 MoNx 动力学电感器。该工艺中电阻和电感的最小特征尺寸为 250 nm。我们给出了在同一或相邻 Nb 层上制作的线宽和间距从 250 nm 到 1 {\mu}m 的 Nb 带状线和微带线电感器的互感数据，以及线宽和电阻均匀性的数据。
引用
@article{arxiv.1704.07683,
title = {Developments Toward a 250-nm, Fully Planarized Fabrication Process With Ten Superconducting Layers And Self-Shunted Josephson Junctions},
author = {Sergey K. Tolpygo and Vladimir Bolkhovsky and Ravi Rastogi and Scott Zarr and Alexandra L. Day and Terence J. Weir and Alex Wynn and Leonard M. Johnson},
journal= {arXiv preprint arXiv:1704.07683},
year = {2018}
}
备注
Extended Abstract: 3 pages, 4 figures, 1 Table, 9 references. 16th International Superconductive Electronics Conference, ISEC 2017, 12-16 June 2017, Sorrento, Italy