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In this work, we demonstrate a silicon nanocrystal Field Effect Transistor (ncFET). Its operation is similar to that of a Tunnelling Field Effect Transistor (TFET) with two barriers in series. The tunnelling barriers are fabricated in very…

介观与纳米尺度物理 · 物理学 2014-05-20 Patrick Harvey-Collard , Dominique Drouin , Michel Pioro-Ladrière

In this work, we demonstrate a dual-gated (DG) MoS2 field effect transistors (FETs) in which the degraded switching performance of multilayer MoS2 can be compensated by the DG structure. It produces large current density (>100 {\mu}A/{\mu}m…

In this work, vertical tunnel field-effect transistors (v-TFETs) based on vertically stacked heretojunctions from 2D transition metal dichalcogenide (TMD) materials are studied by atomistic quantum transport simulations. The switching…

材料科学 · 物理学 2018-08-01 Fan Chen , Hesameddin Ilatikhameneh , Yaohua Tan , Gerhard Klimeck , Rajib Rahman

We present a scaling theory of two-dimensional (2D) field effect transistors (FETs). For devices with channel thickness less than 4 nm, the device electrostatics is dominated by the physical gate oxide thickness and not the effective oxide…

介观与纳米尺度物理 · 物理学 2021-05-25 Saurabh V. Suryavanshi , Chris D. English , H. -S. P. Wong , Eric Pop

In this work, device performances of tunneling field effect transistors (TFETs) based on phosphorene are explored via self-consistent atomistic quantum transport simulations. Phosphorene is an ultra-thin two-dimensional (2-D) material with…

介观与纳米尺度物理 · 物理学 2015-02-27 Jiwon Chang , Chris Hobbs

Here, we propose a Charge Plasma (CP)-based Germanium Double Gate Tunnel Field-Effect Transistor (Ge-DGTFET) device structure, where a CP is induced in the heavily doped source region using the work function engineering of source electrode.…

应用物理 · 物理学 2022-12-29 Sambhu P. Malik , Ajeet K. Yadav , Robin Khosla

In this paper, we have worked out a pseudo two dimensional (2D) analytical model for surface potential and drain current of a long channel p-type Dual Material Gate (DMG) Gate All-Around (GAA) nanowire Tunneling Field Effect Transistor…

介观与纳米尺度物理 · 物理学 2014-06-23 Rajat Vishnoi , M. Jagadesh Kumar

In recent years, a lot of scientific research effort has been put forth for the investigation of Transition Metal Dichalcogenides (TMDC) and other Two Dimensional (2D) materials like Graphene, Boron Nitride. Theoretical investigation on the…

计算物理 · 物理学 2018-02-27 Kanak Datta , Quazi D. M. Khosru

Using calibrated simulations, we report a detailed study of the doping-less tunnel field effect transistor (TFET) on a thin intrinsic silicon film using charge plasma concept. Without the need for any doping, the source and drain regions…

介观与纳米尺度物理 · 物理学 2013-09-26 M. Jagadesh Kumar , Sindhu Janardhanan

The cold source field-effect transistor (CSFET) is promising for reducing power dissipation in integrated circuits by engineering the density of states at the injecting source. Existing CSFET designs utilizing Dirac-source metals or…

材料科学 · 物理学 2026-03-13 Shujin Guo , Qing Shi , Deping Guo , Fei Liu , Xianghua Kong , Yonghong Zhao , Hong Guo

Low power consumption in both static and dynamic modes of operation is a key requirement in modern, highly scaled nanoelectronics. Tunneling field-effect transistors (TFETs) that exploit direct band-to-band tunneling of charges and exhibit…

Topological insulator field-effect transistors (TIFETs) built on 2-D quantum spin Hall insulators are being considered as advanced logic transistors due to their potentially superior performance originating from the dissipationless edge…

介观与纳米尺度物理 · 物理学 2026-03-17 Yungyeong Park , Yosep Park , Hyeonseok Choi , Subeen Lim , Dongwook Kim , Yeonghun Lee

In this work, we simulate the expected device performance and the scaling perspectives of Carbon nanotube Field Effect Transistors (CNT-FETs), with doped source and drain extensions. The simulations are based on the self-consistent solution…

介观与纳米尺度物理 · 物理学 2009-11-11 G. Fiori , G. Iannaccone , G. Klimeck

In recent part extensive simulation work has already been done on TFETs. However this is limited to device performance analysis. Evaluation of circuit performance is a topic that is very little touched. This is due to the non availability…

介观与纳米尺度物理 · 物理学 2011-05-26 Rahul Mishra , Bahniman Ghosh

Two-dimensional (2D) materials are particularly attractive to build the channel of next-generation field-effect transistors (FETs) with gate lengths below 10-15 nm. Because the 2D technology has not yet reached the same level of maturity as…

介观与纳米尺度物理 · 物理学 2023-10-30 Mathieu Luisier , Cedric Klinkert , Sara Fiore , Jonathan Backman , Youseung Lee , Christian Stieger , Áron Szabó

In a continuous search for the energy-efficient electronic switches, a great attention is focused on tunnel field-effect transistors (TFETs) demonstrating an abrupt dependence of the source-drain current on the gate voltage. Among all…

介观与纳米尺度物理 · 物理学 2016-01-19 G. Alymov , V. Vyurkov , V. Ryzhii , D. Svintsov

The single particle tunneling in a vertical stack consisting of monolayers of two-dimensional semiconductors is studied theoretically and its application to a novel Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor…

介观与纳米尺度物理 · 物理学 2014-03-05 Mingda Li , David Esseni , Gregory Snider , Debdeep Jena , Huili Grace Xing

This paper projects the enhanced drive current of a n-type electrostatically doped (ED) tunnel field-effect transistor (ED-TFET) based on heterojunction and band-gap engineering via TCAD 2-D device simulations. The homojunction ED-TFET…

介观与纳米尺度物理 · 物理学 2015-12-22 Kanchan Cecil , Jawar Singh

Power dissipation has become a major obstacle in performance scaling of modern integrated circuits, and has spurred the search for devices operating at lower voltage swing. In this letter, we study p-i-n band-to-band tunneling field effect…

介观与纳米尺度物理 · 物理学 2009-11-13 Siyuranga O. Koswatta , Mark S. Lundstrom , Dmitri E. Nikonov

In this letter we discuss how the short channel behavior in sub 100 nm channel range can be improved by inducing a step surface potential profile at the back gate of an asymmetrical double gate (DG) Silicon-On-Insulator (SOI)…

介观与纳米尺度物理 · 物理学 2010-08-19 M. Jagadesh Kumar , G. V. Reddy