中文

Cs adsorption on Si(001) surface: ab initio study

强关联电子 2007-05-23 v2

摘要

First-principles calculations using density functional theory based on norm-conserving pseudopotentials have been performed to investigate the Cs adsorption on the Si(001) surface for 0.5 and 1 ML coverages. We found that the saturation coverage corresponds to 1 ML adsorption with two Cs atoms occupying the double layer model sites. While the 0.5 ML covered surface is of metallic nature, we found that 1 ML of Cs adsorption corresponds to saturation coverage and leads to a semiconducting surface. The results for the electronic behavior and surface work function suggest that adsorption of Cs takes place via polarized covalent bonding.

关键词

引用

@article{arxiv.cond-mat/0504088,
  title  = {Cs adsorption on Si(001) surface: ab initio study},
  author = {R. Shaltaf and E. Mete and S. Ellialtioglu},
  journal= {arXiv preprint arXiv:cond-mat/0504088},
  year   = {2007}
}

备注

8 pages, 7 figures