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相关论文: Sub-wavelength lithography over extended areas

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We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a…

量子物理 · 物理学 2007-05-23 Gunnar Bjork , Luis L. Sanchez-Soto , Jonas Soderholm

Classical, interferometric, optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon number states, entangled N at a time, we show that…

One-photon or two photon absorption by dye molecules in photopolymers enable direct 2D & 3D lithography of micro/nano structures with high spatial resolution and can be used effectively in fabricating artificially structured nanomaterials.…

软凝聚态物质 · 物理学 2016-09-09 Raghvendra P Chaudhary , Arun Jaiswal , Govind Ummethala , Suyog R Hawal , Sumit Saxena , Shobha Shukla

We propose a super-resolution quantum lithography scheme based on coherent population trapping in lambda-type atoms coupled to temporally-cascaded standing-wave driving fields. By realizing effective multiplication of optical intensity…

量子物理 · 物理学 2008-08-19 Hee Su Park , Sun Kyung Lee

Original realization of a lens capable to transmit images with sub-wavelength resolution is proposed. The lens is formed by parallel conducting wires and effectively operates as a telegraph: it captures image at the front interface and the…

材料科学 · 物理学 2009-11-11 Pavel A. Belov , Yang Hao , Sunil Sudhakaran

Two transformation-optics inspired flat lenses are used to build up an optical system capable to transpose an area surrounding the object focal point in a magnified area surrounding the image focal point. The object and image focal points…

光学 · 物理学 2018-08-10 Mircea Giloan , Robert Gutt

This work presents a new super-resolution imaging approach by using subwavelength hole resonances. We employ a subwavelength structure in which an array of tiny holes are etched in a metallic slab with the neighboring distance $\ell$ that…

光学 · 物理学 2020-10-07 Junshan Lin , Hai Zhang

Quantum lithography achieves phase super-resolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable, with reduced use of quantum…

量子物理 · 物理学 2013-05-30 Shamir Rosen , Itai Afek , Yonatan Israel , Oron Ambar , Yaron Silberberg

Higher resolution demands for semiconductor lithography may be fulfilled by higher numerical aperture (NA) systems. However, NAs more than the photoresist refractive index (~1.7) cause surface confinement of the image. In this letter we…

光学 · 物理学 2012-06-20 Prateek Mehrotra , Chris A. Mack , Richard J. Blaikie

Limited by the cost and complexity, superresolution lithography is hard to achieve through the traditional interference lithography. We here developed the plasmonic interference lithography technique by using a hyperbolic metamaterials…

Inspired by the capability of structured illumination microscopy in subwavelength imaging, many researchers devoted themselves to investigating this methodology. However, due to the free propagating feature of the traditional structured…

We study the possibility of creating spatial patterns having subwavelength size by using the so-called dark states formed by the interaction between atoms and optical fields. These optical fields have a specified spatial distribution. Our…

Imaging with sub-wavelength resolution using a lens formed by periodic metal-dielectric layered structure is demonstrated. The lens operates in canalization regime as a transmission device and it does not involve negative refraction and…

材料科学 · 物理学 2015-06-25 Pavel A. Belov , Yang Hao

Far-field characterization of small objects is severely constrained by the diffraction limit. Existing tools achieving sub-diffraction resolution often utilize point-by-point image reconstruction via scanning or labelling. Here, we present…

Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…

应用物理 · 物理学 2019-02-13 Torstein Nesse , Ingve Simonsen , Bodil Holst

High-precision measurements implemented by means of light is desired in all fields of science. However, light is a wave and Rayleigh criterion gives us a diffraction limitation in classical optics which restricts to get arbitrary high…

量子物理 · 物理学 2015-01-26 Ruifeng Liu , Pei Zhang , Yu Zhou , Hong Gao , Fuli Li

In this letter we experimentally demonstrate a possibility to achieve significant sub-wavelength resolution of a near-field image channeled through a layer of an electromagnetic crystal. An image having radius of $\lambda/10$ has been…

材料科学 · 物理学 2009-11-11 Pekka Ikonen , Pavel Belov , Constantin Simovski , Stanislav Maslovski

With the advent of microsphere assisted microscopy in 2011, this technique emerged as a simple and easy way to obtain optical super-resolution. Although the possible mechanisms of imaging by microspheres are debated in the literature, most…

光学 · 物理学 2015-08-27 Navid Farahi

Wave-based imaging techniques use wavefield data from receivers on the boundary of a domain to produce an image of the underlying structure in the domain of interest. These images are defined by the imaging condition, which maps recorded…

经典物理 · 物理学 2024-04-11 Sarah Greer , Laurent Demanet

It was proposed that a flat silver layer could be used to form a sub-diffraction limited image when illuminated near its surface plasmon resonance frequency [J. B. Pendry, Phys. Rev. Lett. 86, 3966 (2000)]. In this paper, we study the…

光学 · 物理学 2014-08-26 Avner Yanai , Uriel Levy
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