Entangled-State Lithography: Tailoring any Pattern with a Single State
量子物理
2007-05-23 v1
摘要
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a grid, occupying a square with the side half a wavelength long, can be generated from a -photon state.
引用
@article{arxiv.quant-ph/0011075,
title = {Entangled-State Lithography: Tailoring any Pattern with a Single State},
author = {Gunnar Bjork and Luis L. Sanchez-Soto and Jonas Soderholm},
journal= {arXiv preprint arXiv:quant-ph/0011075},
year = {2007}
}
备注
4 pages, 4 figures