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相关论文: Density functional theory study on effect of NO an…

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The effect of the nitrided layer introduced by NO annealing on the electronic structure and carrier scattering property of the 4H-SiC(0001)/SiO$_2$ interface is investigated by the density functional theory calculation using the interface…

材料科学 · 物理学 2025-07-08 Nahoto Funaki , Kosei Sugiyama , Mitsuharu Uemoto , Tomoya Ono

We propose the atomic structures of the 4H-SiC/SiO$_2$ interface for the $a$, $m$, C, and Si faces after NO annealing. Our proposed structures preferentially form at the topmost layers of the SiC side of the interface, which agrees with the…

材料科学 · 物理学 2024-01-09 Naoki Komatsu , Mizuho Ohmoto , Mitsuharu Uemoto , Tomoya Ono

We investigated the influence of vacuum annealing on interface properties of silicon carbide (SiC) metal-oxide-semiconductor (MOS) structures. For as-oxidized and nitric oxide (NO)-annealed samples, the interface state density ($D_{\rm…

材料科学 · 物理学 2019-07-29 Koji Ito , Takuma Kobayashi , Tsunenobu Kimoto

In this paper, SiO2 layers deposited on 4H-SiC and subjected to different post deposition annealing (PDA) in NO and N2O were studied to identify the key factors influencing the channel mobility and threshold voltage stability in 4H-SiC…

We investigate the effect of SiC stacking on the 4H-SiC/SiO$_2$ interface, both in the presence and absence of O defects, which appear during thermal oxidation, via first principles calculations. It is known that 4H-SiC(0001) has two…

材料科学 · 物理学 2015-08-10 Christopher James Kirkham , Tomoya Ono

A nitridation annealing process is well employed to reduce interface trap states that degrade the channel mobility of 4H-SiC/SiO${}_2$ metal-oxide-semiconductor field-effect transistor. In recent experiments, the existence of high N-atom…

材料科学 · 物理学 2021-12-15 Mitsuharu Uemoto , Naoki Komatsu , Yoshiyuki Egami , Tomoya Ono

Renormalization of the Coulomb interaction in layered metals results in a strongly anisotropic plasma mode with low frequencies for small components of wave vector in the in-plane direction. Interaction of electrons with this mode was found…

超导电性 · 物理学 2007-05-23 S. N. Artemenko , S. V. Remizov

To clarify the cause of the low channel conductivity at the SiO2/4H-SiC interface, the wavefunction at the SiC conduction band minimum was calculated using density functional theory under an applied electric field. We found that the…

材料科学 · 物理学 2023-06-05 Hironori Yoshioka , Jun-Ichi Iwata , Yu-ichiro Matsushita

Using positive muons as local probes implanted at low energy enables gathering information about the material of interest with nanometer depth resolution (low energy muon spin rotation spectroscopy (LE-$\mu$SR). In this work, we leverage…

The dielectric breakdown at metal-oxide interfaces is a critical electronic device failure mechanism. Electronic tunneling through dielectric layers is a well-accepted explanation for this phenomenon. Theoretical band alignment studies,…

材料科学 · 物理学 2016-10-28 Eric Tea , Jianqiu Huang , Celine Hin

We present first-principles calculations of the structural and electronic properties of Si(001)-SiO2 interfaces. We first arrive at reasonable structures for the c-Si/a-SiO2 interface via a Monte-Carlo simulated annealing applied to an…

材料科学 · 物理学 2009-10-31 Kwok-On Ng , David Vanderbilt

We report that annealing in low-oxygen-partial-pressure (low-p$_{\rm O2}$) ambient is effective in reducing the interface state density (D$_{\rm IT}$) at a SiC (0001)/SiO$_{\rm 2}$ interface near the conduction band edge (E$_{\rm C}$) of…

材料科学 · 物理学 2019-02-19 Takuma Kobayashi , Keita Tachiki , Koji Ito , Tsunenobu Kimoto

The role of the discontinuity of the exchange-correlation potential of density functional theory is studied in the context of electron transport and shown to be intimately related to Coulomb blockade. By following the time evolution of an…

介观与纳米尺度物理 · 物理学 2010-06-08 S. Kurth , G. Stefanucci , E. Khosravi , C. Verdozzi , E. K. U. Gross

The structural, electronic, and adhesive properties of Cu/SiO$_2$ interfaces are investigated using first-principles density-functional theory within the local density approximation. Interfaces between fcc Cu and $\alpha$-cristobalite(001)…

材料科学 · 物理学 2016-08-31 Kazutaka Nagao , J. B. Neaton , N. W. Ashcroft

This article develops a consistent theory of free carrier screening of a two-dimensional electron gas in the silicon inversion layer in the presence of stacked layers of dielectric environment-commonly knows as gate stack in context of…

介观与纳米尺度物理 · 物理学 2013-01-15 Aniruddha konar , Mohit Bajaj , Rajan K. Pandey , Ninad Sathaye , Murali V. Kota

We report the transport characteristics of both electrons and holes through narrow constricted crystalline Si "wall-like" long-channels that were surrounded by a thermally grown SiO2 layer. Importantly, as a result of the existence of fixed…

介观与纳米尺度物理 · 物理学 2015-10-28 C. S. Mayberry , Danhong Huang , G. Balakrishnan , C. Kouhestani , N. Islam , S. R. J. Brueck , A. K. Sharma

In this work, the effects of the duration of the post deposition annealing (PDA) in nitric oxide (NO) on the properties of SiO2/4H-SiC interfaces in n-channel lateral MOSFETs are investigated, with a special focus on the modifications of…

Semiconductor surfaces with narrow surface bands provide unique playgrounds to search for Mott-insulating state. Recently, a combined experimental and theoretical study [Phys. Rev. Lett. 114, 247602 (2015)] of the two-dimensional (2D) Sn…

材料科学 · 物理学 2016-01-18 Seho Yi , Hunpyo Lee , Jin-Ho Choi , Jun-Hyung Cho

We study the effects of insulating oxides in their crystalline forms on the energy band structure of monolayer and bilayer graphene using a \textit{first principles} density functional theory based electronic structure method and a local…

材料科学 · 物理学 2011-12-09 Priyamvada Jadaun , Sanjay K. Banerjee , Leonard F. Register , Bhagawan Sahu

We calculate the mobility of a two-dimensional electron gas residing at the interface of LaAlO$_{3}$/SrTiO$_{3}$ following a three band Boltzmann approach at low temperature, where carrier-charged impurity scattering process is assumed to…

介观与纳米尺度物理 · 物理学 2016-06-22 A. Faridi , R. Asgari , A. Langari
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