相关论文: Deposition of the stoichiometric coatings by react…
In this work, amorphous thin films in Mg-Si-O-N system were prepared in order to investigate the dependence of optical and mechanical properties on Mg composition. Reactive RF magnetron co-sputtering from magnesium and silicon targets were…
A magnetron sputtering method for the production of thin-film libraries with a spatially varying composition, x, in Bi2Sr2Ca1-xYxCu2Oy (0<=x<=0.5) has been developed. Two targets with a composition of Bi2Sr2YCu2O_{8.5 + \delta} and…
Polycarbonate (PC) and protective (Ti,Al)N coatings exhibit extremely different material properties, specifically crystal structure, thermal stability, elastic and plastic behavior as well as thermal expansion coefficients. These…
Coatings of ternary nanocomposite Si-C-N ceramic coatings have shown newer and improved mechanical and functional properties over the coarser and monolithic coatings. Properties like high hardness, wear resistance, oxidation resistance,…
Magnetron sputtering is a perfect technique for processing nanomaterials for engineering and medical applications. A material can be processed with specific mechanical properties, microstructure, and surface texture by controlling the…
A combinatorial thin-film synthesis approach combined with a high throughput analysis methodology was successfully applied to synthesize TiN/Ni coatings with optimum mechanical properties. The synthesis approach consists of the deposition…
We present recent achievement on manufacturing optical filter and multilayers done with two complementary RF magnetron sputtering approaches: deposition duration control and in situ optical reflectance monitoring. Those approaches were…
The results of characterization of TiAlSiON hard coatings deposited on ferric-chromium AISI 430 stainless steel by plasma enhanced magnetron sputtering are presented. The coating with maximum hardness (of 45 GPa) was obtained at the…
This paper presents the findings of the synthesis of multicomponent (Al, W, Ni, Ti, Nb) alloy coatings from mosaic targets. For the study, a pulsed magnetron sputtering method was employed under different plasma generation conditions:…
Epitaxial copper thin films were deposited by magnetron sputtering. The adatoms during deposition are influenced by deposition parameters which cause variations in thin film properties. XRD and FESEM studies were done to get an insight into…
Magnetron sputtering is a widely used physical vapor deposition technique. Reactive sputtering is used for the deposition of, e.g, oxides, nitrides and carbides. In fundamental research, versatility is essential when designing or upgrading…
Technological advancements are strongly required to fulfill the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders. To this purpose an extensive R&D regarding…
Ga2O3 thin films were deposited by reactive magnetron sputtering from a liquid gallium target. The influence of deposition temperature, substrate type, and discharge parameters on the structural and electrical properties was systematically…
Magnesium nanostructures find increased use in applications for hydrogen storage, catalysis, waste treatment, and heat storage to name a few. Currently, most nanoparticles are made using a chemical synthesis approach, necessitating the use…
NbN films were deposited on SS substrates by reactive DC magnetron sputtering at various N2 flow rates and substrate biasing. Effect of N2 flow rate and substrate biasing has been studied on deposition rate, surface hardness,…
Electronic phase coherence in normal metals is incredibly sensitive to magnetic scattering. As a result, the weak localization magnetoresistance and time-dependent universal conductance fluctuations are powerful probes of magnetic…
We present a synchrotron-based X-ray scattering technique which allows disentangling magnetic properties of heterogeneous systems with nanopatterned surfaces. This technique combines the nmrange spatial resolution of surface morphology…
We present a systematic study of the properties of TiN films by varying the deposition conditions in an ultra-high-vacuum reactive magnetron sputtering chamber. By increasing the deposition pressure from 2 to 9 mTorr while keeping a nearly…
This paper reports on the deposition and photoluminescence of amorphous and crystalline thin films of zinc gallium oxide with Ga:Zn atomic ratio varied between 0.3 and 5.7. The films are prepared by reactive direct current magnetron…
The work is devoted to the investigation of the surface plasmon polaritons in the metal - dielectric heterostructures containing materials with magnetoelectric properties. The analysis of various possible configurations shows that the…