相关论文: Addendum to `Mapping electron dynamics in highly t…
We measured for the first time the electron density in an Extreme Ultra-Violet induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density…
The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to…
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…
In this paper we introduce a new diagnostic technique that uses prominence EUV and UV absorption to determine the prominence plasma electron temperature and column emission measure, as well as He/H relative abundance; if a realistic…
Novel methods for diagnostics of molecular hydrogen plasma processes, such as ionization, production of high vibrational levels, dissociation of molecules via excitation to singlet and triplet states and production of metastable states, are…
We present a novel time- and phase-resolved, background-free scheme to study the extreme ultraviolet dipole emission of a bound electronic wavepacket, without the use of any extreme ultraviolet exciting pulse. Using multiphoton transitions,…
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy…
A comprehensive theory is proposed to describe the propagation and absorption of ultra-intense, short laser pulse through the under-dense plasma. The kinetic aspects of plasma are fully incorporated using extensive particle-in-cell (PIC)…
Aims: We generate theoretical ultraviolet and extreme-ultraviolet emission line ratios for O IV and show their strong versatility as electron temperature and density diagnostics for astrophysical plasmas. Methods: Recent fully relativistic…
We present a theoretical evaluation of radiation dose constraints for extreme ultraviolet (EUV) and soft X-ray microscopy. Our work particularly addresses the long-standing concern regarding strong absorption of EUV radiation in biological…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is…
The emission of multi-MeV ($\gamma$-ray) photons from the interaction of a high-powered laser pulse with a dense plasma target is studied using particle-in-cell simulations. A new set of diagnostic techniques is presented and applied to…
Measurements of plasma electric fields are essential to the advancement of plasma science and applications. Methods for non-invasive in situ measurements of plasma fields on sub-millimeter length scales with high sensitivity over a large…
Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigating damage caused by deposition of tin…
Nonintrusive measurements of plasma properties are essential to evaluate, and numerically simulate, the in-flight performance of electric propulsion systems. As a logical first step in the development of new diagnostic techniques, this work…
In this article, we present a detailed characterisation of a multicusp-assisted inductively coupled RF plasma source for plasma immersion ion implantation (PIII). Using laser-induced fluorescence (LIF) and RF-compensated Langmuir probe…
For the first time the emission of the radiative dissociation continuum of the hydrogen molecule ($a^{3}\Sigma_{g}^{+} \to b^{3}\Sigma_{u}^{+}$ electronic transition) is proposed to be used as a source of information for the spectroscopic…
Fundamental to many applications of laser pulses in science and technology is an extended interaction length with matter that significantly exceeds the distance over which the pulse would normally diffract and transversely spread. At low…