小电子自由路径金属：电阻饱和与递增
强关联电子
2009-11-07 v2 材料科学
摘要
金属的电阻通常要么在 Ioffe-Regel 极限（自由路径 等于晶格常数 ）之外递增，要么在此点处饱和。我们认为，两种行为都没有得到充分理解，且“递增”并不一定比“饱和”更神秘。
引用
@article{arxiv.cond-mat/0108343,
title = {Metals with Small Electron Mean-Free Path: Saturation versus Escalation of Resistivity},
author = {Philip B. Allen},
journal= {arXiv preprint arXiv:cond-mat/0108343},
year = {2009}
}
备注
3 pages with 3 embedded figures. This article is intended for the Zacchary Fisk festschrift, which will be published in Physica B