Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"
量子物理
2007-05-23 v1
摘要
Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.
引用
@article{arxiv.quant-ph/0305042,
title = {Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"},
author = {Ole Steuernagel},
journal= {arXiv preprint arXiv:quant-ph/0305042},
year = {2007}
}
备注
1 page