相关论文: GPU-Accelerated Inverse Lithography Towards High Q…
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle…
As the feature size of integrated circuits continues to decrease, optical proximity correction (OPC) has emerged as a crucial resolution enhancement technology for ensuring high printability in the lithography process. Recently, level…
Inverse lithography (ILT) is critical for modern semiconductor manufacturing but suffers from highly non-convex objectives that often trap optimization in poor local minima. Generative AI has been explored to warm-start ILT, yet most…
This paper presents an iterative inversion algorithm for computed tomography image reconstruction that performs well in terms of accuracy and speed using limited data. The computational method combines an image domain technique and…
Edge-preserving image smoothing is a fundamental procedure for many computer vision and graphic applications. There is a tradeoff between the smoothing quality and the processing speed: the high smoothing quality usually requires a high…
In this paper, we propose a novel gradient-based method to optimize curvilinear masks in optical lithography. The mask pattern is represented by periodic B-spline curves. We apply Delaunay triangulation to discretize the domains circled by…
Creating visual layouts is a critical step in graphic design. Automatic generation of such layouts is essential for scalable and diverse visual designs. To advance conditional layout generation, we introduce BLT, a bidirectional layout…
Facial image inpainting is a challenging problem as it requires generating new pixels that include semantic information for masked key components in a face, e.g., eyes and nose. Recently, remarkable methods have been proposed in this field.…
As integrated circuit (IC) dimensions shrink below the lithographic wavelength, optical lithography faces growing challenges from diffraction and process variability. Model-based optical proximity correction (OPC) and inverse lithography…
Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based OPC, termed as inverse lithography technology (ILT), has…
Photonic Crystal Surface Emitting Lasers (PCSEL)'s inverse design demands expert knowledge in physics, materials science, and quantum mechanics which is prohibitively labor-intensive. Advanced AI technologies, especially reinforcement…
Inverse design (ID) is a computational method that systematically explores a design space to find optimal device geometries based on specific performance criteria. In silicon photonics, ID often leads to devices with design features that…
In the realm of lithography, Optical Proximity Correction (OPC) is a crucial resolution enhancement technique that optimizes the transmission function of photomasks on a pixel-based to effectively counter Optical Proximity Effects (OPE).…
We present an improved inverse ray-shooting code based on GPUs for generating microlensing magnification maps. In addition to introducing GPUs for acceleration, we put the efforts in two aspects: (i) A standard circular lens plane is…
For robust visual-inertial SLAM in perceptually-challenging indoor environments,recent studies exploit line features to extract descriptive information about scene structure to deal with the degeneracy of point features. But existing…
Recovering the intrinsic physical attributes of a scene from images, generally termed as the inverse rendering problem, has been a central and challenging task in computer vision and computer graphics. In this paper, we present GUS-IR, a…
Extreme Ultraviolet (EUV) photolithography is seen as the key enabler for increasing transistor density in the next decade. In EUV lithography, 13.5 nm EUV light is illuminated through a reticle, holding a pattern to be printed, onto a…
Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generation quantum devices. Metastable atom lithography with binary…
Computed Tomography (CT) has been widely adopted in medicine and it is increasingly being used in scientific and industrial applications. Parallelly, research in different mathematical areas concerning discrete inverse problems has led to…
Inverse rendering seeks to estimate scene characteristics from a set of data images. The dominant approach is based on differential rendering using Monte-Carlo. Algorithms as such usually rely on a forward model and use an iterative…