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To overcome the limit of diffraction while achieving the superresolution technique, solid immersion lenses are the key optical elements for data storage and nanophotonics applications. Recent demonstrations have shown how different…
In this article we propose an original classification method for unobscured imaging systems unfolded in two dimensions. This classification is based on a study of off-axis properties, and relies on topology and algorithm of real algebraic…
Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive manner. EUV scatterometry is investigated for the…
This is the second article in a series of two which report on a matrix approach for ultrasound imaging in heterogeneous media. This article describes the quantification and correction of aberration, i.e. the distortion of an image caused by…
The relentless pursuit of understanding matter at ever-finer scales has pushed optical microscopy to surpass the diffraction limit and produced the super-resolution microscopy which enables visualizing structures shorter than the wavelength…
Using the illuminator for high numerical aperture (NA) extreme ultraviolet (EUV) exposure tool in EUV lithography can lead to support volume production of sub-2 nm logic nodes and leading-edge DRAM nodes. However, the typical design method…
Dynamic scattering and imaging with coherent, ultrafast, extreme ultraviolet (EUV) light sources can resolve charge, phonon and spin processes on their intrinsic length and time scales. However, full field coherent diffraction imaging…
Geometric optics is often described as tracing the paths of non-diffracting rays through an optical system. In the paraxial limit, ray traces can be calculated using ray transfer matrices (colloquially, ABCD matrices), which are 2x2…
We performed extreme ultraviolet spectroscopy using an 80 lines/mm TEM mesh as dispersive element. We present the usefulness of this instrument for dispersing a high harmonic spectrum from the 13th to the 29th harmonic of a Ti:Sapph laser,…
Plane-parallel resonator configuration is proposed for high-NA EUV lithography, where the lithography mask and the wafer are parallelly arranged through two focusing mirrors. EUV light is injected through an off-axis rotating mirror at the…
Thick diffractive optical elements offer a promising way to achieve focusing or imaging at a resolution approaching 1 nm for X-ray wavelengths shorter than about 0.1 nm. Efficient focusing requires that these are fabricated with structures…
Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition.…
The optimization of an optical system benefits greatly from a study of its aberrations and an identification of each of its elements' contribution to the overall aberration figures. The matrix formalism developed by one of the authors was…
Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. In a detailed convergence study it is shown that accurate results can be attained for relatively large 3D…
High-resolution patterning of periodic structures over large areas has several applications in science and technology. One such method, based on the long-known Talbot effect observed with diffraction gratings, is achromatic Talbot…
In addition to the optical aberrations, the magnitude of the optical cells of detectors is one of the most important parameters, which restricts the resolution of detectors. Adaptive optic and the methods of reducing the aberrations are…
Imaging in thick biological tissues is often degraded by sample-induced aberrations, which reduce image quality and resolution, particularly in super-resolution techniques. While hardware-based adaptive optics, which correct aberrations…
Extreme adaptive optics systems are now in operation across the globe. These systems, capable of high order wavefront correction, deliver Strehl ratios of 90% in the near-infrared. Originally intended for the direct imaging of exoplanets,…
We present a promising approach to the extremely fast sensing and correction of small wavefront errors in adaptive optics systems. As our algorithm's computational complexity is roughly proportional to the number of actuators, it is…
Reflection high-energy electron diffraction (RHEED) is a powerful tool for characterizing crystal surface structures. However, the setup geometry leads to distorted and complicated patterns, which are not straightforward to link to the…