相关论文: The method of solving initial structure by Seidel …

We apply the Lie algebraic method to reflecting optical systems with plane-symmetric freeform mirrors. Using analytical ray-tracing equations we construct an optical map. The expansion of this map gives us the aberration coefficients in…

Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At…

Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the…

Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high-numerical aperture (high-NA)…

The presence of off-axis tilt and Petzval curvature, two of the lowest-order off-axis Seidel aberrations, is shown to improve the Fisher information of two-point separation estimation in an incoherent imaging system compared to an…

Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflective projection optics makes it inaccessible for small-scale…

Thick biological tissues give rise to not only the scattering of incoming light waves, but also aberrations of the remaining unscattered waves. Due to the inability of existing optical imaging methodologies to overcome both of these…

In optical imaging, light propagation is affected by the inhomogeneities of the medium. Sample-induced aberrations and multiple scattering can strongly degrade the image resolution and contrast. Based on a dynamic correction of the incident…

This paper proposes a simple, four-mirror, in-line projector for high-NA EUV lithography that eliminates the most troublesome mask 3D effect. The design consists of a two-stage concave-convex pair, where optical aberrations are cancelled…

We describe a diffraction microscopy technique based on refractive optics to study structural variations in crystals. The X-ray beam diffracted by a crystal was magnified by beryllium parabolic refractive lenses on a 2D X-ray camera. The…

Imaging systems are inherently prone to aberrations. We present an optimization method to design two-dimensional freeform reflectors that minimize aberrations for various parallel ray beams incident on the optical system. We iteratively…

Microscope objectives achieve near diffraction-limited performance only when used under the conditions they are designed for. In non-standard geometries, such as thick cover slips or curved surfaces, severe aberrations arise, inevitably…

In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…

Extreme ultraviolet (EUV) scatterometry is an increasingly important metrology that can measure critical parameters of periodic nanostructured materials in a fast, accurate, and repeatable manner and with high sensitivity to nanoscale…

Higher resolution demands for semiconductor lithography may be fulfilled by higher numerical aperture (NA) systems. However, NAs more than the photoresist refractive index (~1.7) cause surface confinement of the image. In this letter we…

Developing a suitable production method for three-dimensional periodic nanostructures with high aspect ratios is a subject of growing interest. For mass production, Talbot lithography offers many advantages. However, one disadvantage is…

An ideal imaging system provides a spatial resolution that is ultimately dictated by the numerical aperture (NA) of the illumination and collection optics. In biological tissue, resolution is further affected by scattering limiting the…

The surface figure of x-ray mirrors can be improved by differential deposition of thin films. To achieve the required corrections, WSi2 layers of variable thickness were deposited through beam-defining apertures of different openings. The…

We consider the problem of imaging extended reflectors in terminating waveguides. We form the image by back-propagating the array response matrix projected on the waveguide's non-evanescent modes. The projection is adequately defined for…

Experimentally obtained X-ray diffraction (XRD) patterns can be difficult to solve, precluding the full characterization of materials, pharmaceuticals, and geological compounds. Herein, we propose a method based upon a multi-objective…