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This paper proposes a simple, four-mirror, in-line projector for high-NA EUV lithography that eliminates the most troublesome mask 3D effect. The design consists of a two-stage concave-convex pair, where optical aberrations are cancelled…

Using the illuminator for high numerical aperture (NA) extreme ultraviolet (EUV) exposure tool in EUV lithography can lead to support volume production of sub-2 nm logic nodes and leading-edge DRAM nodes. However, the typical design method…

In this study, we used parallel plane mirror resonator analogy to design all-dielectric optical resonator that is performed with the objective-first inverse design algorithm. Confinement of the light is succeeded via predefined objective…

This paper discusses a simple, low-cost, highly efficient two-mirror projector with a simplified illumination system. The EUV source power can be reduced by 1/10 compared to the current six-mirror EUV projector system. The required EUV…

Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflective projection optics makes it inaccessible for small-scale…

Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At…

We demonstrate high resolution extreme ultraviolet (EUV) coherent diffractive imaging in the most general reflection geometry by combining ptychography with tilted plane correction. This method makes it possible to image extended surfaces…

A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for…

We propose a nested Wolter-I mirror design for a neutron condenser, which is based on established X-ray telescope technology. We demonstrate through simulations that it can increase the flux density at the ESS imaging instrument ODIN by up…

We show theoretically and experimentally how a flat-top second-order response can be achieved with a self-coupled single add-drop ring resonator based on two couplers with different splitting ratios. The resulting device is a 1x1 filter,…

The absence of efficient light modulators for extreme ultraviolet (EUV) and X-ray photons significantly limits their real-life application, particularly when even slight complexity of the beam patterns is required. Here we report on a novel…

The problem of pattern formation in resonantly-enhanced near-field lithography by the use of dielectric or plasmonic planar resonators is investigated. Sub-diffraction-limited bright or dark spots can be produced by taking advantage of the…

Sub-wavelength resolution imaging requires high numerical aperture (NA) lenses, which are bulky and expensive. Metasurfaces allow the miniaturization of conventional refractive optics into planar structures. We show that high-aspect-ratio…

Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…

We present an optical system based on two toroidal mirrors in a Wolter configuration to focus broadband XUV radiation. Optimization of the focusing optics alignment is carried out with the aid of an XUV wavefront sensor. Back-propagation of…

It is shown that a system of two coupled planar material sheets possessing surface mode (polariton) resonances can be used for the purpose of evanescent field restoration and, thus, for the sub-wavelength near-field imaging. The sheets are…

In optical imaging, achieving high resolution often comes at the expense of a shallow depth of field. This means that when using a standard microscope, any minor movement of the object along the optical axis can cause the image to become…

Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high-numerical aperture (high-NA)…

Optically resonant dielectric metasurfaces offer unique capability to fully control the wavefront, polarisation, intensity or spectral content of light based on the excitation and interference of different electric and magnetic Mie…

We introduce optical polarization-insensitive high pass filters based on total internal reflection of light at the interface of two dielectric media (1D) and Bragg reflection of a multilayer stack (2D) in transmission mode. The wavevectors…