相关论文: EUV-induced Hydrogen Plasma : Pulsed Mode Operatio…
Relativistic flying mirrors in plasmas are realized as thin dense electron (or electron-ion) layers accelerated by high-intensity electromagnetic waves to velocities close to the speed of light in vacuum. The reflection of an…
The dynamics of H atom recombination on materials of interest for a EUV lithographer was studied under a longterm low-pressure H2 plasma exposure. The similarity of the experimental plasma with the typical EUV-induced plasma over the…
We demonstrate a novel technique for producing high-order harmonics with designer spectral combs in the extreme ultraviolet-soft X-ray range for resonance applications using spectrally controlled visible lasers. Our approach enables…
This paper presents the process of plasma formation during laser induced breakdown spectroscopy (LIBS) along with analysis of emission from double pulse LIBS to better understand the processes and the factors involved in enhancement of…
Microplasmas can be used for a wide range of technological applications and to improve our understanding of fundamental physics. Scanning electron microscopy, on the other hand, provides insights into the sample morphology and chemistry of…
We present experimental results of vacuum laser acceleration (VLA) of electrons using radially polarized laser pulses interacting with a plasma mirror. Tightly focused radially polarized laser pulses have been proposed for electron…
We investigate the laser-induced quantum interference in EUV superfluorescence occurring in a dense gas of $\Lambda$-type helium atoms coupled by a coherent laser field in the visible region. Due to the constructive interatomic and…
Plane-parallel resonator configuration is proposed for high-NA EUV lithography, where the lithography mask and the wafer are parallelly arranged through two focusing mirrors. EUV light is injected through an off-axis rotating mirror at the…
We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave…
In this letter, cutting-edge 3D Particle-In-Cell simulations are used to demonstrate that so-called relativistic plasma mirrors irradiated by PetaWatt (PW) lasers and naturally curved by laser radiation pressure can be used to tightly focus…
Extreme Ultraviolet (EUV) photolithography is seen as the key enabler for increasing transistor density in the next decade. In EUV lithography, 13.5 nm EUV light is illuminated through a reticle, holding a pattern to be printed, onto a…
Sub-picosecond optical laser processing of metals is actively utilized for modification of a heated surface layer. But for deeper modification of different materials a laser in the hard x-ray range is required. Here, we demonstrate that a…
Plasmas generated using energetic electron beams are well known for their low electron temperature ($T_{e}$) and plasma potential, which makes them attractive for atomic-precision plasma processing applications such as atomic layer etch and…
Exceptional pulse contrast can be critical for ultraintense laser experiments, particularly when using solid density targets, and their use is becoming widespread. However, current plasma mirror technology is becoming inadequate for the new…
Plasmon resonance in metals represents the collective oscillation of the free electron gas density and enables enhanced light-matter interactions in nanoscale dimensions. Traditionally, the classical Drude model describes the plasmonic…
High-energy ultraviolet pulse generation in gas-filled hollow capillary fibers (HCFs) through dispersive-wave-emission process, has attracted considerable attentions in recent several years due to its great application potentials in…
The ongoing development of intense high-harmonic generation (HHG) sources has recently enabled highly nonlinear ionization of atoms by the absorption of at least 10 extreme-ultraviolet (XUV) photons within a single atom [Senfftleben…
An influence of plasma channel created by a filament of focused UV or IR femtosecond laser pulse ({\lambda}=248 nm or 740 nm) on characteristics of other plasma channel formed by a femtosecond pulse at the same wavelength following the…
Thin Cr films 28-nm thick deposited on glass substrates were processed by scanning low-intensity femtosecond laser pulses with energy well below single-pulse damage threshold. Two types of laser-induced periodic surface structures (LIPSS)…
High-intensity laser pulses covering the ultraviolet to terahertz spectral regions are nowadays routinely generated in a large number of laboratories. In contrast, intense extreme-ultraviolet (XUV) pulses have only been demonstrated using a…