相关论文: EUV-induced Hydrogen Plasma : Pulsed Mode Operatio…
Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the…
Deep ultraviolet (DUV) laser pulses with tuneable wavelength and very short duration are a key enabling technology for next-generation technology and ultrafast science. Their generation has been the subject of extensive experimental effort,…
We investigate the shape of a tin sheet formed from a droplet struck by a nanosecond laser pulse. Specifically, we examine the dynamics of the process as a function of laser beam properties, focusing on the outstanding riddle of curvature…
The employment of ultrashort laser sources at the mid-IR spectral region for transparent materials is designed to open new routes for laser patterning and a wealth of exciting applications in optics and photonics. To elucidate the material…
Mo-Si multilayer mirrors are central to extreme ultraviolet lithography, where nanoscale optical interference and heat accumulation together constrain reflectivity and operational stability. Here we develop an analytical…
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…
Pulsed plasmas in liquids exhibit complex interaction between three phases of matter (liquids, gas, plasmas) and are currently used in a wide range of applications across several fields, however significant knowledge gaps in our…
Experimental spectroscopic studies are presented, in a 5.5--25.5nm extreme-ultraviolet (EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin microdroplets by 5-ns-pulsed, 2-$\mu$m-wavelength laser…
EUV (Extreme-Ultraviolet) waves are globally propagating disturbances that have been observed since the era of the SoHO/EIT instrument. Although the kinematics of the wave front and secondary wave components have been widely studied, there…
We discuss an experimental scheme to create a low-dimensional gas of ultracold atoms, based on inelastic bouncing on an evanescent-wave mirror. Close to the turning point of the mirror, the atoms are transferred into an optical dipole trap.…
This paper describes the construction and performance of a VUV-simulator that has been designed to study degradation of materials under space conditions. It is part of the Complex Irradiation Facility at DLR in Bremen, Germany, that has…
In the past two decades, tremendous efforts have been exerted to understand and control the delivery of ultrashort laser pulses into various types of transparent materials ranging from glass and crystal to polymer and even bio-materials.…
The present paper describes the current baseline optical design of POLLUX, a high-resolution spectropolarimeter for the future LUVOIR mission. The instrument will operate in the ultraviolet (UV) domain from 90 to 390 nm in both…
The extreme ultraviolet (XUV) emission from dense plasmas generated with sub-10-fs laser pulses with varying peak intensities up to 3*10^16 W/cm^2 is investigated for different target materials. K shell spectra are obtained from low Z…
This paper presents a simplified theoretical model for the study of emission from laser produced plasma to better understand the processes and the factors involved in the onset of saturation in plasma emission as well as in increasing…
Spectral measurements play a vital role in understanding laser-plasma interactions. The ability to accurately measure the spectrum of radiation sources is crucial for unraveling the underlying physics. In this article, we introduce a novel…
Controlling fluxes of vacuum ultraviolet (VUV) radiation is important in a number of industrial and biomedical applications of low pressure plasma sources because, depending on the process, VUV radiation may be desired, required to a…
Pulses of extreme ultraviolet (XUV) light, with wavelengths between 10 and 100$\,$nm, can be used to image and excite ultra-fast phenomena such as the motion of atomic electrons. Here we show that the illumination of plasma with…
An emission tomography of laser-induced plasmas employed in the laser induced breakdown spectroscopy (LIBS) requires long signal integration times during which the plasma cannot be considered stationary. To reduce the integration time, it…
The advent of Petawatt-class laser systems allows generating electro-magnetic fields of unprecedented strength in a controlled environment, driving increasingly more efforts to probe yet unobserved processes through their interaction with…