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相关论文: Influence of vacuum annealing on interface propert…

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We report that annealing in low-oxygen-partial-pressure (low-p$_{\rm O2}$) ambient is effective in reducing the interface state density (D$_{\rm IT}$) at a SiC (0001)/SiO$_{\rm 2}$ interface near the conduction band edge (E$_{\rm C}$) of…

材料科学 · 物理学 2019-02-19 Takuma Kobayashi , Keita Tachiki , Koji Ito , Tsunenobu Kimoto

Density functional theory calculations for the electronic structures of the 4H-SiC(0001)/SiO$_2$ interface with atomic-scale steps are carried out to investigate the effect of NO annealing. The characteristic behavior of the conduction band…

材料科学 · 物理学 2024-01-09 Mitsuharu Uemoto , Nahoto Funaki , Kazuma Yokota , Takuji Hosoi , Tomoya Ono

In this paper, SiO2 layers deposited on 4H-SiC and subjected to different post deposition annealing (PDA) in NO and N2O were studied to identify the key factors influencing the channel mobility and threshold voltage stability in 4H-SiC…

To improve mobility of fabricated silicon metal-oxide-semiconductor (MOS) quantum devices, forming gas annealing is a common method used to mitigate the effects of disorder at the Si/SiO2 interface. However, the importance of activation…

介观与纳米尺度物理 · 物理学 2020-05-21 Ke Wang , Hai-Ou Li , Gang Luo , Xin Zhang , Fang-Ming Jing , Rui-Zi Hu , Yuan Zhou , He Liu , Gui-Lei Wang , Gang Cao , Ming Xiao , Hong-Wen Jiang , Guo-Ping Guo

We propose the atomic structures of the 4H-SiC/SiO$_2$ interface for the $a$, $m$, C, and Si faces after NO annealing. Our proposed structures preferentially form at the topmost layers of the SiC side of the interface, which agrees with the…

材料科学 · 物理学 2024-01-09 Naoki Komatsu , Mizuho Ohmoto , Mitsuharu Uemoto , Tomoya Ono

Using positive muons as local probes implanted at low energy enables gathering information about the material of interest with nanometer depth resolution (low energy muon spin rotation spectroscopy (LE-$\mu$SR). In this work, we leverage…

We determined the interface state density ($D_{\rm it}$) distributions in the vicinity of the conduction band edge in silicon carbide (SiC) metal-oxide-semiconductor (MOS) structures by reproducing the experimental current-voltage…

材料科学 · 物理学 2020-09-07 Koji Ito , Takuma Kobayashi , Tsunenobu Kimoto

Electronic and dielectric properties of vapor-phase grown MoS_{2} have been investigated in metal/MoS_{2}/silicon capacitor structures by capacitance-voltage and conductancevoltage techniques. Analytical methods confirm the MoS_{2} layered…

材料科学 · 物理学 2019-07-19 M. Belete , S. Kataria , U. Koch , M. Kruth , C. Engelhard , J. Mayer , O. Engström , M. C. Lemme

The effect of the nitrided layer introduced by NO annealing on the electronic structure and carrier scattering property of the 4H-SiC(0001)/SiO$_2$ interface is investigated by the density functional theory calculation using the interface…

材料科学 · 物理学 2025-07-08 Nahoto Funaki , Kosei Sugiyama , Mitsuharu Uemoto , Tomoya Ono

This work reports on the effect of high temperature annealing on the electrical properties of p-type implanted 4H-SiC. Ion implantations of Aluminium (Al) at different energies (30 - 200 keV) were carried out to achieve 300 nm thick…

We present a computational study of the void-induced microstructure in amorphous silicon ($\it a$-Si) by generating ultra-large models of $\it a$-Si with a void-volume fraction of 0.3$\%$, as observed in small-angle x-ray scattering (SAXS)…

无序系统与神经网络 · 物理学 2019-10-02 Durga Paudel , Raymond Atta-Fynn , David A. Drabold , Parthapratim Biswas

The quasi two-dimensional electron gas (q-2DEG) at oxide interfaces provides a platform for investigating quantum phenomena in strongly correlated electronic systems. Here, we study the transport properties at the high-mobility…

We present first-principles calculations of the structural and electronic properties of Si(001)-SiO2 interfaces. We first arrive at reasonable structures for the c-Si/a-SiO2 interface via a Monte-Carlo simulated annealing applied to an…

材料科学 · 物理学 2009-10-31 Kwok-On Ng , David Vanderbilt

In this work, the effects of the duration of the post deposition annealing (PDA) in nitric oxide (NO) on the properties of SiO2/4H-SiC interfaces in n-channel lateral MOSFETs are investigated, with a special focus on the modifications of…

We study the interface evolution of a series of periodic Co/Mo2C multilayers as a function of the annealing temperature up to 600{\textdegree}C. Different complementary techniques are implemented to get information on the phenomenon taking…

A nitridation annealing process is well employed to reduce interface trap states that degrade the channel mobility of 4H-SiC/SiO${}_2$ metal-oxide-semiconductor field-effect transistor. In recent experiments, the existence of high N-atom…

材料科学 · 物理学 2021-12-15 Mitsuharu Uemoto , Naoki Komatsu , Yoshiyuki Egami , Tomoya Ono

The role of interface states and dielectric mismatch is studied in ultrathin P-doped silicon-on-insulator (SOI) films with thickness of the device layer ($H_{SOI}$) varying from 30 to 8 nm and dopant concentration ($n_{D}$) ranging from…

The effect of vacuum annealing on superconductivity is investigated in Fe(Se,Te) single crystals. It is found that superconductivity is not enhanced by annealing under high vacuum (~ 10^(-3) Pa) or by annealing in a sealed evacuated quartz…

超导电性 · 物理学 2013-05-14 Seiki Komiya , Masafumi Hanawa , Ichiro Tsukada , Atsutaka Maeda

Several models of oxygenated and hydrogenated surfaces of Si quantum wells and Si nanocrystals of variable shapes have been constructed in order to assess curvature effects on energy gaps due to the three Si-suboxides. Si-suboxides in…

材料科学 · 物理学 2015-05-13 Pierre Carrier

In magnetic tunnel junctions based on iron oxide nanoparticles the disorder and the oxidation state of the surface spin as well as the nanoparticles functionalization play a crucial role in the magnetotransport properties. In this work, we…

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