中文
相关论文

相关论文: Impact of gate leakage considerations in tunnel fi…

200 篇论文

Gate-All-Around Field-Effect Transistors (GAAFETs), now entering high-volume production as successors to fin field-effect transistor technology, are enabling continued scaling and enhanced performance in advanced semiconductor nodes.…

其他凝聚态物理 · 物理学 2026-03-24 Juan P. Mendez , Coleman Cariker , Michael Titze , Alex A. Belianinov , Denis Mamaluy

We investigate the effect of a small leakage current through the gate insulator on the stability of organic single-crystal field-effect transistors (FETs). We find that, irrespective of the specific organic molecule and dielectric used,…

其他凝聚态物理 · 物理学 2009-11-10 R. W. I. de Boer , N. N. Iosad , A. F. Stassen , T. M. Klapwijk , A. F. Morpurgo

Tunnel field effect transistor (TFET) devices are attractive as they show good scalability and have very low leakage current. However they suffer from low on-current and high threshold voltage. In order to employ the TFET for circuit…

介观与纳米尺度物理 · 物理学 2015-05-19 Sneh Saurabh , M. Jagadesh Kumar

Tunnel Field Effect Transistors (TFET) have extremely low leakage current, exhibit excellent subthreshold swing and are less susceptible to short channel effects. However, TFETs do face certain special challenges, particularly with respect…

介观与纳米尺度物理 · 物理学 2010-10-19 Sneh Saurabh , M. Jagadesh Kumar

Power dissipation has become a major obstacle in performance scaling of modern integrated circuits, and has spurred the search for devices operating at lower voltage swing. In this letter, we study p-i-n band-to-band tunneling field effect…

介观与纳米尺度物理 · 物理学 2009-11-13 Siyuranga O. Koswatta , Mark S. Lundstrom , Dmitri E. Nikonov

Security and energy are considered as the most important parameters for designing and building a computing system nowadays. Today's attacks target different layers of the computing system (i.e. software and hardware). Introduction of new…

密码学与安全 · 计算机科学 2017-04-27 Shayan Taheri , Jiann-Shiun Yuan

Field-effect transistors (FETs) with single gates are adversely affected by short channel effects such as drain-induced barrier lowering (DIBL) and increases in the magnitude of sub-threshold swing as the channel length is reduced.…

材料科学 · 物理学 2026-04-22 Chankeun Yoon , Juhan Ahn , Yuchen Zhou , Jaydeep P. Kulkarni , Ananth Dodabalapur

In this paper we have developed a two dimensional (2D) analytical model for surface potential and drain current for a long channel Dual Material Gate (DMG) Silicon-on-Insulator (SOI) Tunneling Field Effect Transistor (TFET). This model…

介观与纳米尺度物理 · 物理学 2014-05-27 Rajat Vishnoi , M. Jagadesh Kumar

We fabricate planar all-graphene field-effect transistors with self-aligned side-gates at 100 nm from the main graphene conductive channel, using a single lithographic step. We demonstrate side-gating below 1V with conductance modulation of…

Using self-consistent quantum transport simulation on realistic devices, we show that InAs band-to-band Tunneling Field Effect Transistors (TFET) with a heavily doped pocket in the gate-source overlap region can offer larger ON current and…

介观与纳米尺度物理 · 物理学 2010-11-17 Kartik Ganapathi , Youngki Yoon , Sayeef Salahuddin

Traditional transistors based on complementary metal-oxide-semiconductor (CMOS) and metal-oxide-semiconductor field-effect transistors (MOSFETs) are facing significant limitations as device scaling reaches the limits of Moore's Law. These…

应用物理 · 物理学 2024-09-30 Chloe Isabella Tsang , Haihui Pu , Junhong Chen

In this paper we propose a modified structure of TFET incorporating ferroelectric oxide as the complementary gate dielectric operating in negative capacitance zone, called the Negative Capacitance Tunnel FET (NCTFET). The proposed device…

综合物理 · 物理学 2014-05-21 Nadim Chowdhury , S. M. Farhaduzzaman Azad , Quazi D. M. Khosru

In this work, the performance of Tunnel Field-Effect Transistors (TFETs) based on two-dimensional Transition Metal Dichalcogenide (TMD) materials is investigated by atomistic quantum transport simulations. One of the major challenges of…

Steep transistors are crucial in lowering power consumption of the integrated circuits. However, the difficulties in achieving steepness beyond the Boltzmann limit experimentally have hindered the fundamental challenges in application of…

介观与纳米尺度物理 · 物理学 2018-05-09 Hesameddin Ilatikhameneh , Tarek Ameen , ChinYi Chen , Gerhard Klimeck , Rajib Rahman

The dielectric engineered tunnel field-effect transistor (DE-TFET) as a high performance steep transistor is proposed. In this device, a combination of high-k and low-k dielectrics results in a high electric field at the tunnel junction. As…

介观与纳米尺度物理 · 物理学 2015-10-23 Hesameddin Ilatikhameneh , Tarek A. Ameen , Gerhard Klimeck , Joerg Appenzeller , Rajib Rahman

In this paper, we propose the application of a Dual Material Gate (DMG) in a Tunnel Field Effect Transistor (TFET) to simultaneously optimize the on-current, the off-current and the threshold voltage, and also improve the average…

介观与纳米尺度物理 · 物理学 2011-08-17 Sneh Saurabh , M. Jagadesh Kumar

Silicon carbide (SiC) metal-oxide-semiconductor field-effect-transistors (MOSFETs) enable high-voltage and high-temperature power conversion. Compared to Si devices, they suffer from pronounced gate leakage due to the reduced electron…

材料科学 · 物理学 2025-12-03 Ang Feng , Alexander Karl , Dominic Waldhör , Marina Avramenko , Peter Moens , Tibor Grasser

In a continuous search for the energy-efficient electronic switches, a great attention is focused on tunnel field-effect transistors (TFETs) demonstrating an abrupt dependence of the source-drain current on the gate voltage. Among all…

介观与纳米尺度物理 · 物理学 2016-01-19 G. Alymov , V. Vyurkov , V. Ryzhii , D. Svintsov

Using 2-D self-consistent ballistic quantum transport simulations, we investigate the short-channel behavior of graphene field-effect transistors and its impact on the device transconductance and subsequently the intrinsic cut-off frequency…

介观与纳米尺度物理 · 物理学 2011-10-31 Kartik Ganapathi , Youngki Yoon , Sayeef Salahuddin

A widely used technique to mitigate the gate leakage in the ultra-scaled metal oxide semiconductor field effect transistors (MOSFETs) is the use of high-k dielectrics, which provide the same equivalent oxide thickness (EOT) as $\rm SiO_2$,…

介观与纳米尺度物理 · 物理学 2016-08-30 Mehdi Salmani-Jelodar , Hesameddin Ilatikhameneh , SungGeun Kim , Kwok Ng , Gerhard Klimeck
‹ 上一页 1 2 3 10 下一页 ›