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相关论文: First-principles study of metal-induced gap states…

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Based on recent advances in first-principles theory, we develop a general model of the band offset at metal/ferroelectric interfaces. We show that, depending on the polarization of the film, a pathological regime might occur where the…

材料科学 · 物理学 2015-05-27 Massimiliano Stengel , Pablo Aguado-Puente , Nicola A. Spaldin , Javier Junquera

Barrier planes described by the Ionic Hubbard model and sandwiched between metallic planes on both sides are studied using unrestricted Hartree Fock. For zero onsite correlation, the presence of the metallic interface generates an…

强关联电子 · 物理学 2011-04-20 Tribikram Gupta , Sanjay Gupta

We present ab-initio local density FLAPW calculations on non-reactive N-terminated [001] ordered GaN/Ag and GaN/Au interfaces and compare the results (such as metal induced gap states and Schottky barrier heights) with those obtained for…

材料科学 · 物理学 2009-10-31 S. Picozzi , A. Continenza , G. Satta , S. Massidda , A. J. Freeman

The oxygen vacancy is a crucial intrinsic defect in metal-ultrathin oxide semiconductor heterostructures, and its formation at an interface is of great importance in determining the device performance and degradation. This paper presents an…

材料科学 · 物理学 2016-11-11 Guanchen Li , Eric Tea , Jianqiu Huang , Celine Hin

Metallic interfaces between insulating perovskites are often observed in heterostructures combining polar and nonpolar materials. In these systems, the polar discontinuity across the interface may drive an electronic reconstruction inducing…

强关联电子 · 物理学 2014-10-22 Yukiko Omori , Andreas Rüegg , Manfred Sigrist

We have shown, both experimentally and theoretically, that the metal-induced gap states (MIGS) can exist in epitaxially grown organic insulator/metal interfaces. The experiment is done for alkane/Cu(001) with an element-selective near edge…

Motivated from the experimental observation of metal induced gap states (MIGS) at insulator/metal interfaces by Kiguchi {\it et al.} [Phys. Rev. Lett. {\bf 90}, 196803 (2003)], we have theoretically investigated the electronic properties of…

材料科学 · 物理学 2009-11-10 Ryotaro Arita , Yoshiaki Tanida , Kazuhiko Kuroki , Hideo Aoki

In order to search for states specific to insulator/metal interfaces, we have studied epitaxially grown interfaces with element-selective near edge X-ray absorption fine structure (NEXAFS). An extra peak is observed below the bulk edge…

The barrier formation for metal/organic semiconductor interfaces is analyzed within the Induced Density of Interface States (IDIS) model. Using weak chemisorption theory, we calculate the induced density of states in the organic energy gap…

材料科学 · 物理学 2009-11-10 H. Vazquez , F. Flores , R. Oszwaldowski , J. Ortega , R. Perez , A. Kahn

A number of electronic devices involve metal/oxide interfaces in their structure where the oxide layer plays the role of electrical insulator. As the downscaling of devices continues, the oxide thickness can spread over only a few atomic…

材料科学 · 物理学 2017-04-26 Eric Tea , Jianqiu Huang , Guanchen Li , Celine Hin

We investigated electronic structure and magnetic anisotropy in the Fe/MgO interface of magnetic metal and dielectric insulator under the Cr layer of small electronegativity, by means of the first-principles density functional approach. The…

材料科学 · 物理学 2017-08-09 Nurul Ikhsan , Tomosato Kanagawa , Indra Pardede , Masao Obata , Tatsuki Oda

The possibility of novel behavior at interfaces between strongly and weakly correlated materials has come under increased study recently. In this paper, we use determinant Quantum Monte Carlo to determine the inter-penetration of metallic…

强关联电子 · 物理学 2013-05-30 M. Jiang , G. G. Batrouni , R. T. Scalettar

We present a theoretical investigation of the voltage-driven metal insulator transition based on solving coupled Boltzmann and Hartree-Fock equations to determine the insulating gap and the electron distribution in a model system -- a one…

强关联电子 · 物理学 2018-12-03 Giuliano Chiriacò , Andrew J. Millis

The dielectric breakdown at metal-oxide interfaces is a critical electronic device failure mechanism. Electronic tunneling through dielectric layers is a well-accepted explanation for this phenomenon. Theoretical band alignment studies,…

材料科学 · 物理学 2016-10-28 Eric Tea , Jianqiu Huang , Celine Hin

A Metal-Disordered Mott insulator-Metal heterostructure is studied at half-fiiling using unrestricted Hartree Fock method. The corresponding clean system has been shown to be an insulator for any finite on site correlation. Interestingly we…

强关联电子 · 物理学 2011-03-22 Sanjay Gupta , Tribikram Gupta

Motivated by the direct observation of electronic phase separation in first-order Mott transitions, we model the interface between the thermodynamically coexisting metal and Mott insulator. We show how to model the required slab geometry…

强关联电子 · 物理学 2017-05-24 Juho Lee , Chuck-Hou Yee

We study the effect of spatial inhomogeneity on the physics of a strongly correlated electron system exhibiting a metallic phase and a Mott insulating phase, represented by the simple Hubbard model. In three dimensions, we consider various…

强关联电子 · 物理学 2015-05-14 Giovanni Borghi , Michele Fabrizio , Erio Tosatti

Potential steps exceeding 1 eV are regularly formed at metal|insulator interfaces, even when the interaction between the materials at the interface is weak physisorption. From first-principles calculations on metal|h-BN interfaces we show…

介观与纳米尺度物理 · 物理学 2014-12-01 Menno Bokdam , Geert Brocks , Paul J. Kelly

The electronic and magnetic properties of Fe/GaAs(001) magnetic junctions are investigated using first-principles density-functional calculations. Abrupt and intermixed interfaces are considered, and the dependence of charge transfer,…

其他凝聚态物理 · 物理学 2009-11-11 D. O. Demchenko , Amy Y. Liu

Charge transport through metal-Mott-insulator interfaces is studied and compared with that through metal-band-insulator interfaces. For band insulators, rectification has been known to occur owing to a Schottky barrier, which is produced by…

强关联电子 · 物理学 2009-04-27 Kenji Yonemitsu , Nobuya Maeshima , Tatsuo Hasegawa
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