相关论文: Estimation of the Efficiency of Material Injection…
Reactive sputtering is a plasma-based technique to deposit a thin film on a substrate. This contribution presents a novel parameter-interval estimation method for a well-established model that describes the uncertain and nonlinear reactive…
Parameters of a dense 10^13-10^14cm^-3) multicomponent gas-metal plasma in the pulsed reflex discharge with a moderate power (W \leq 10 MW) have been studied. The dynamics of the plasma density in time, the mass-element composition of the…
The development of sputtering facilities, at the moment, is mainly pursued through experimental tests, or simply by expertise in the field, and relies much less on numerical simulation of the process environment. This leads to great efforts…
In order to improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionization of the sputtered vapor, we developed an ionized physical vapor deposition method based on pre-ionized pulsed magnetron…
During plasma spray process hot droplet of melted metal or ceramic inpinge cold target. In some processes this target should be destroyed by the thermal flux. It is why in this report the freezing and layering of the droplet on the cold…
The paper provides a tutorial to the conceptual layout of a self-consistently coupled Particle-In-Cell/Test-Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains…
In the paper, the functional definition of a plasma for-injector of separable material is presented, and the requirements to it are formulated. The version of a device for the material separation into elements based on the beam-plasma…
Thin film processing by means of sputter deposition inherently depends on the interaction of energetic particles with a target surface and the subsequent particle transport. The length and time scales of the underlying physical phenomena…
Ion nitriding and ion carburising by plasma discharges are promising techniques in order to modify the surface of austenitic steels. Plasma treatments improve mechanical properties, e.g., hardness and wear resistance. Indeed, these…
We present simulations of metallization morphologies under ionized sputter deposition conditions, obtained by a new theoretical approach. By means of molecular dynamics simulations using a carefully designed interaction potential, we…
Spectroscopic investigations of the properties of a plasma produced by a flashboard plasma source, commonly used in pulsed plasma experiments, are presented. The plasma is used to prefill a planar 0.4-ms-conduction time plasma opening…
Magnetron sputtering is a widely used physical vapor deposition technique. Reactive sputtering is used for the deposition of, e.g, oxides, nitrides and carbides. In fundamental research, versatility is essential when designing or upgrading…
Plasma accelerators utilize strong electric fields in plasma waves to accelerate charged particles, making them a compact alternative to radiofrequency technologies. Discharge capillaries are plasma sources used in plasma accelerator…
This work presents the numerical simulation of the melting process of a particle injected in a plasma jet. The plasma process is nowadays applied to produce thin coatings on metal mechanical components with the aim of improving the surface…
The transport of sputtered aluminum inside a multi frequency capacitively coupled plasma chamber is simulated by means of a kinetic test multi-particle approach. A novel consistent set of scattering parameters obtained for a modified…
We explore the physics of electron acceleration in a plasma medium in an effective field theory framework. Employing a multiple Compton scattering mechanism, it is found that the acceleration can be sustained in such a medium so as to…
The modeling of powder compaction process, such as spark plasma sintering (SPS), requires the determination of the visco-plastic deformation behavior of the particle material including the viscosity moduli. The establishment of these…
Gas load and pumping determine the quality of vacuum systems. In particle accelerators, once leaks are excluded, outgassing of materials is an important source of gas together with degassing induced by particle beams. Understanding,…
A new experimental equipment allowing to study the sputtering induced by ion beam irradiation is presented. The sputtered particles are collected on a catcher which is analyzed in situ by Auger electron spectroscopy without breaking the…
We outline a machine learning strategy for determining the effective interaction in the condensed phases of matter using scattering. Via a case study of colloidal suspensions, we showed that the effective potential can be probabilistically…