中文

Two-Photon Interferometry for High-Resolution Imaging

量子物理 2009-11-07 v5

摘要

We discuss advantages of using non-classical states of light for two aspects of optical imaging: creating of miniature images on photosensitive substrates, which constitutes the foundation for optical lithography, and imaging of micro objects. In both cases, the classical resolution limit given by the Rayleigh criterion is approximately a half of the optical wavelength. It has been shown, however, that by using multi-photon quantum states of the light field, and multi-photon sensitive material or detector, this limit can be surpassed. We give a rigorous quantum mechanical treatment of this problem, address some particularly widespread misconceptions and discuss the requirements for turning the research on quantum imaging into a practical technology.

关键词

引用

@article{arxiv.quant-ph/0104115,
  title  = {Two-Photon Interferometry for High-Resolution Imaging},
  author = {Dmitry Strekalov and Jonathan Dowling},
  journal= {arXiv preprint arXiv:quant-ph/0104115},
  year   = {2009}
}

备注

Presented at PQE 2001. To appear in Special Issue of Journal of Modern Optics