Diffusional Relaxation in Random Sequential Deposition
统计力学
2009-10-28 v1
摘要
The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expression for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.
引用
@article{arxiv.cond-mat/9610181,
title = {Diffusional Relaxation in Random Sequential Deposition},
author = {Eli Eisenberg and Asher Baram},
journal= {arXiv preprint arXiv:cond-mat/9610181},
year = {2009}
}
备注
9 pages + 2 figures