相关论文: Two-dimensional Nanolithography Using Atom Interfe…
We propose a laser interference nano-lithography technique for fabrication of nano-structures. This is inspired by a 2pi-illumination system that consists of two cylindrical lens arranged face-to-face at a distance 2f with a common…
The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental…
Laser Interference Lithography (LIL) is a versatile fabrication method for patterning sub-micron structures in arrays covering large areas. It is a facile and fast mask-less lithography process to produce large area periodic patterns. The…
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions.…
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without…
With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer,…
We propose a super-resolution quantum lithography scheme based on coherent population trapping in lambda-type atoms coupled to temporally-cascaded standing-wave driving fields. By realizing effective multiplication of optical intensity…
We report on the fabrication of nanocontacts by indentation of an ultrathin insulating photoresist layer deposited on various types of conductive structures. A modified atomic force microscope (AFM) designed for local resistance…
Interference with atomic and molecular matter waves is a rich branch of atomic physics and quantum optics. It started with atom diffraction from crystal surfaces and the separated oscillatory fields technique used in atomic clocks. Atom…
We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be…
An integrated interference and colloid sphere lithography (IICL) is presented to produce complex plasmonic structures consisting of wavelength-scaled periodic arrays of nano-objects with arbitrary array symmetry and controllable nano-scaled…
We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
We present a fully quantum scheme to perform 2D atomic lithography based on a cross-cavity optical Stern-Gerlach setup: an array of two mutually orthogonal cavities crossed by an atomic beam perpendicular to their optical axes, which is…
Matter-wave interferometry with increasingly larger masses could pave the way to understanding the nature of wavefunction collapse, the quantum to classical transition or even how an object in a spatial superposition interacts with its…
We present a new method for nanoscale atom lithography. We propose the use of a supersonic atomic beam, which provides an extremely high-brightness and cold source of fast atoms. The atoms are to be focused onto a substrate using a thin…
We propose to integrate dark-state based localization techniques into a neutral atom quantum computing architecture and numerically investigate two specific schemes. The first scheme implements state-selective projective measurement by…
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a…
We have shown via explicit analysis as well as numerical simulation the design of two large angle interferometers employing two-photon pulses. The first one uses the technique of adiabatic following in a dark state to produce a large…
Atom interferometry is the most successful technique for precision metrology. However, current interferometers using ultracold atoms allows one to probe the interference pattern only momentarily and has finite duty cycle, resulting in an…