We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of producing arbitrary one and two dimensional high-resolution patterns with high contrast.
@article{arxiv.1505.04496,
title = {Magnetic Resonance Lithography with Nanometer Resolution},
author = {Fahad AlGhannam and Philip Hemmer and Zeyang Liao and M. Suhail Zubairy},
journal= {arXiv preprint arXiv:1505.04496},
year = {2015}
}