相关论文: High-NA In-Line Projector for EUV Lithography

Traditional glass-based optics are typically optimized for narrow spectral bands, such as the visible (400-700nm) or shortwave infrared (1000-1800nm). While the emergence of VIS-SWIR sensors (400-1700nm) offers transformative potential,…

In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…

We present a concept of the X-ray imaging system with high angular-resolution and moderate sensitivity. In this concept, a two-dimensional detector, i.e., imager, is put at a slightly out-of-focused position of the focusing mirror, rather…

Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios. Application of nanostructures like diffractive X-ray…

Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the…

We propose a laser interference nano-lithography technique for fabrication of nano-structures. This is inspired by a 2pi-illumination system that consists of two cylindrical lens arranged face-to-face at a distance 2f with a common…

We present high-speed and wide-field EUV ptychography at 13.5 nm wavelength using a table-top high-order harmonic source. By employing a scientific complementary metal oxide semiconductor (sCMOS) detector the scan time for sub-20 nm…

The future success of integrated circuits (IC) technology relies on the continuing miniaturization of the feature size, allowing more components per chip and higher speed. Extreme anisotropy opens new opportunities for spatial pattern…

Here, we demonstrate a simple direct maskless laser-based approach for fabrication of back-reflector-coupled plasmonic nanorings arrays. The approach is based on delicate ablation of an upper metal film of a metal-insulator-metal (MIM)…

This paper presents a non-zoned discrete dielectric lens comprising two or three matching layers to reduce the 50-110 GHz frequency range reflections. Based on Chebyshev and binomial multi-section transformers, the designed models use…

Flat lenses enable thinner, lighter, and simpler imaging systems. However, large-area and high-NA flat lenses have been elusive due to computational and fabrication challenges. Here, we applied inverse design to create a multi-level…

Higher resolution demands for semiconductor lithography may be fulfilled by higher numerical aperture (NA) systems. However, NAs more than the photoresist refractive index (~1.7) cause surface confinement of the image. In this letter we…

We report the design, nanofabrication, and characterization of high-quality polymer-based micromirror structures employing the 3D two-photon polymerization lithography technique. Compared to conventional microcavity approaches, our…

A light field print (LFP) displays three-dimensional (3D) information to the naked-eye observer under ambient white light illumination. Changing perspectives of a 3D image are seen by the observer from varying angles. However, LFPs appear…

We introduce optical polarization-insensitive high pass filters based on total internal reflection of light at the interface of two dielectric media (1D) and Bragg reflection of a multilayer stack (2D) in transmission mode. The wavevectors…

We demonstrate high resolution extreme ultraviolet (EUV) coherent diffractive imaging in the most general reflection geometry by combining ptychography with tilted plane correction. This method makes it possible to image extended surfaces…

We perform 3D lithography simulations by using a finite-element solver. To proof applicability to real 3D problems we investigate DUV light propagation through a structure of size 9 microns times 4 microns times 65 nm. On this relatively…

Nanocrystalline textured EuO thin films are prepared by an oxygen loss process from a pure Eu2O3 bulk ceramic target through pulsed laser deposition in vacuum at room temperature. X-ray diffraction spectra evidence a well-defined…

Illuminating or imaging samples from a broad angular range is essential in a wide variety of computational 3D imaging and resolution-enhancement techniques, such as optical projection tomography (OPT), optical diffraction tomography (ODT),…

This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon…