相关论文: Discharge properties of a magnetized cylindrical c…
We investigate the discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma discharge with an axisymmetric magnetic field generating an EXB drift in the azimuthal direction. Vital…
The physics of capacitively coupled plasma (CCP) discharges is investigated in a mildly magnetized regime, defined by $1 \le f_{ce}/f_{rf} < 2$, where $f_{ce}$ and $f_{rf}$ denote the electron cyclotron frequency and the applied…
The effects of the discharge voltage on the formation and nature of electric field transients in a symmetric, collisionless, very high frequency, capacitively coupled plasma are studied using a self-consistent particle-in-cell (PIC)…
In this work, we analyze the creation of the discharge asymmetry and the concomitant formation of the DC self-bias voltage in capacitively coupled radio frequency plasmas driven by multi-frequency waveforms, as a function of the electrode…
The behavior of capacitive coupled plasma (CCP) discharges is investigated in a mildly magnetized regime, defined by the condition 1 $\leq$ $f_{ce}/f_{rf}$ $\lt$ 2, where $f_{ce}$ and $f_{rf}$ are the cyclotron and radio-frequencies (RF),…
In this study, we have investigated the production of negative ions by mixing electronegative oxygen gas with electropositive argon gas in a geometrically asymmetric cylindrical capacitively coupled radio frequency plasma discharge. The…
A self-consistent particle-in-cell simulation study is performed to investigate the effect of driving frequency on the electric field non-linearity, electron heating mechanism and electron energy distribution function (EEDF) in a low…
We report the existence of an enhanced operating regime for a high-frequency, low-pressure capacitively coupled plasma (CCP) discharge in the presence of a weak magnetic field applied parallel to the electrodes. Our PIC-MCC simulations show…
The electron dynamics and the mechanisms of power absorption in radio-frequency (RF) driven, magnetically enhanced capacitively coupled plasmas (MECCPs) at low pressure are investigated. The device in focus is a geometrically asymmetric…
The power of second harmonic electromagnetic emission is calculated for the case when strong plasma turbulence is excited by a powerful electron beam in a magnetized plasma. It is shown that the simple analytical model of strong plasma…
Following requirements of the plasma processing industry for increasing throughput, capacitively coupled plasma reactors with large area electrodes driving by very high frequency sources have been proposed. However, such reactors with…
A self-consistent 1-D model was developed to study the effect of the electron energy distribution function (EEDF) on power deposition and plasma density profiles in a planar inductively coupled plasma (ICP) in the non-local regime (pressure…
To establish the electron energy distribution function (EEDF), the second derivative of a Langmuir probe current-voltage (I-V) characteristic is numerically integrated using the Tikhonov singular value decomposition regularized method. A…
In this work, the one-dimensional implicit particle-in-cell/Monte-Carlo collision code (PIC/MCC) is used to study the discharge of a capacitively coupled plasma (CCP) under extremely low pressure driven by high-frequency rf power in pure…
In magnetized capacitively coupled radio-frequency discharges operated at low pressure the influence of the magnetic flux density on discharge properties has been studied recently both by experimental investigations and in simulations. It…
The importance of accounting for an ambipolar electrostatic potential or a non-uniform density profile for modelling of inductively coupled discharges is demonstrated. A drastic enhancement is observed of the power transfer into plasma for…
Parameters of a high frequency capacitive discharge in argon in axially symmetric chambers of different geometries are studied in experiments and by means of two-dimensional kinetic modeling by the Particle-in-Cell method. It is…
Discharge structure refers to the morphology of different plasma quantities, such as electron temperature, reaction rate, plasma potential, mass flux, net charge and species density, which are determined by plasma transport mechanism and…
A system of automated computerized Langmuir probe measurements is used in order to determine the plasma parameters in a plasma reactor constructed for cleaning of metallic artifacts by RF discharge. A compensated probe insures the…
This paper presents the plasma potential distribution across magnetic field lines in an argon/oxygen plasma created by 13.56 MHz CCRF discharge consisting of a pair of ring electrodes. It is found that the radial plasma density, electron…