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相关论文: A Memory Window Expression to Predict the Scaling …

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A memory window of ferroelectric field-effect transistors (FeFETs), defined as a separation of the HIGH-state and the LOW-state threshold voltages, is an important measure of the FeFET memory characteristics. In this study, we theoretically…

应用物理 · 物理学 2022-11-04 Kasidit Toprasertpong , Mitsuru Takenaka , Shinichi Takagi

Ferroelectric field-effect-transistor (FEFET) has emerged as a scalable solution for 3D NAND and embedded flash (eFlash), with recent progress in achieving large memory window (MW) using metal-insulator-ferroelectric-insulator-semiconductor…

材料科学 · 物理学 2024-07-01 Song-Hyeon Kuk , Kyul Ko , Bong Ho Kim , Jae-Hoon Han , Sang-Hyeon Kim

Ferroelectrics offer a promising materials platform to realize energy-efficient non-volatile memory technology with the FeFET-based implementations being one of the most area-efficient ferroelectric memory architectures. However, the FeFET…

系统与控制 · 电气工程与系统科学 2021-08-30 Jaykumar Vaidya , R S Surya Kanthi , Shamiul Alam , Nazmul Amin , Ahmedullah Aziz , Nikhil Shukla

Ferroelecticity, one of the keys to realize nonvolatile memories owing to the remanent electric polarization, has been an emerging phenomenon in the two-dimensional (2D) limit. Yet the demonstrations of van der Waals (vdW) memories using 2D…

Long-range moire patterns in twisted WSe2 enable a built-in, moire-length-scale ferroelectric polarization that can be directly harnessed in electronic devices. Such a built-in ferroic landscape offers a compelling means to enable…

材料科学 · 物理学 2025-12-10 Arup Singha , Shaili Sett , Kenji Watanabe , Takashi Taniguchi , Arindam Ghosh , Rahul Debnath

In tunnel junctions with ferroelectric barriers, switching the polarization direction modifies the electrostatic potential profile and the associated average tunnel barrier height. This results in strong changes of the tunnel transmission…

介观与纳米尺度物理 · 物理学 2014-02-07 S. Boyn , S. Girod , V. Garcia , S. Fusil , S. Xavier , C. Deranlot , H. Yamada , C. Carrétéro , E. Jacquet , M. Bibes , A. Barthélémy , J. Grollier

Intimate integration of memory devices with logic transistors is a frontier challenge in computer hardware. This integration is essential for augmenting computational power concurrently with enhanced energy efficiency in big-data…

FeFETs hold strong potential for advancing memory and logic technologies, but their inherent randomness arising from both operational cycling and fabrication variability poses significant challenges for accurate and reliable modeling.…

机器学习 · 计算机科学 2025-08-06 Tasnia Nobi Afee , Jack Hutchins , Md Mazharul Islam , Thomas Kampfe , Ahmedullah Aziz

Interfacial ferroelectricity offers a promising platform for ultrafast, low-power memory devices. While previous studies have demonstrated the importance of domain wall in polarization switching, the coexistence of various domain wall types…

材料科学 · 物理学 2025-12-24 Hao-Wen Xu , Wen-Cheng Fan , Jun-Ding Zheng , Cheng-Shi Yao , Ni Zhong , Wen-Yi Tong , Chun-Gang Duan

We present a study based on numerical simulations and comparative analysis of recent experimental data concerning the operation and design of FeFETs. Our results show that a proper consideration of charge trapping in the…

新兴技术 · 计算机科学 2022-09-13 Daniel Lizzit , David Esseni

Ferroelectric field effect transistors (FeFETs) are being actively investigated with the potential for in-memory computing (IMC) over other non-volatile memories (NVMs). Content Addressable Memories (CAMs) are a form of IMC that performs…

新兴技术 · 计算机科学 2020-07-20 Xunzhao Yin , Chao Li , Qingrong Huang , Li Zhang , Michael Niemier , Xiaobo Sharon Hu , Cheng Zhuo , Kai Ni

Field-effect transistors (FETs) based on 2D materials have already reached the stage of trial FAB integration. However, reliability limitations caused by various defects present a serious obstacle for their smooth way forward, especially…

材料科学 · 物理学 2025-07-18 Yezhu Lv , Haihui Cai , Yehao Wu , Yu. Yu. Illarionov

In this study, we propose a measurement technique for evaluating ferroelectric polarization characteristics in ferroelectric field-effect transistors (FeFETs). Different from standard metal/ferroelectric/metal capacitors, the depletion and…

应用物理 · 物理学 2020-06-17 Kasidit Toprasertpong , Kento Tahara , Mitsuru Takenaka , Shinichi Takagi

The memory wall bottleneck is a key challenge across many data-intensive applications. Multi-level FeFET-based embedded non-volatile memories are a promising solution for denser and more energy-efficient on-chip memory. However, reliable…

分布式、并行与集群计算 · 计算机科学 2021-06-23 Mohammad Mehdi Sharifi , Lillian Pentecost , Ramin Rajaei , Arman Kazemi , Qiuwen Lou , Gu-Yeon Wei , David Brooks , Kai Ni , X. Sharon Hu , Michael Niemier , Marco Donato

A Ferroelectric Analog Non-Volatile Memory based on a WOx electrode and ferroelectric HfZrO4 layer is fabricated at a low thermal budget (~375C), enabling BEOL processes and CMOS integration. The devices show suitable properties for…

Silicon ferroelectric field-effect transistors (FeFETs) with low-k interfacial layer (IL) between ferroelectric gate stack and silicon channel suffers from high write voltage, limited write endurance and large read-after-write latency due…

With the broad recent research on ferroelectric hafnium oxide for non-volatile memory technology, depolarization effects in HfO2-based ferroelectric devices gained a lot of interest. Understanding the physical mechanisms regulating the…

新兴技术 · 计算机科学 2025-08-13 Luca Fehlings , Thomas Mikolajick , Beatriz Noheda , Erika Covi

Ferroelectric materials with switchable electric polarization hold great promise for a plethora of emergent applications, such as post-Moore's law nanoelectronics, beyond-Boltzmann transistors, non-volatile memories, and above-bandgap…

Ferroelectric field effect transistor (FeFET) memory has shown the potential to meet the requirements of the growing need for fast, dense, low-power, and non-volatile memories. In this paper, we propose a memory architecture named…

系统与控制 · 电气工程与系统科学 2022-05-25 Mor M. Dahan , Evelyn T. Breyer , Stefan Slesazeck , Thomas Mikolajick , Shahar Kvatinsky

A Ferroelectric Analog Non-Volatile Memory based on a WOx electrode and ferroelectric HfZrO$_4$ layer is fabricated at a low thermal budget (~375$^\circ$C), enabling BEOL processes and CMOS integration. The devices show suitable properties…

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