相关论文: Grazing incidence interaction of Sn particles with…

Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigating damage caused by deposition of tin…

In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…

Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (LEEs) produced upon illumination of resist materials with…

We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a…

We study the interaction of electromagnetic (EM) radiation with single-layer graphene and a stack of parallel graphene sheets at arbitrary angles of incidence. It is found that the behavior is qualitatively different for transverse magnetic…

Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high-numerical aperture (high-NA)…

The spectral dispersion of light is critical in applications ranging from spectroscopy to sensing and optical communication technologies. We demonstrate that ultra-high spectral dispersion can be achieved with a finite-size surface plasmon…

A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this…

We present a comprehensive characterization of laser-produced tin (Sn) plasmas relevant to extreme ultraviolet (EUV) lithography using a multi-diagnostic suite integrated into the new experimental platform, "SparkLight". Tin plasmas are…

This study presents a comprehensive simulation-based optimization of gallium nitride (GaN)-based metal-semiconductor-metal (MSM) photodetectors designed for ultraviolet (UV) applications. The proposed device architecture incorporates a…

In the search for novel nanostructured materials for UV plasmonics a limited number of choices can be done. Materials such as aluminum, rhodium, gallium and few others can be used. One of the most interesting application for UV plasmonics…

The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to…

Improvement of tool reliability and uptime is a current focus in development of extreme ultraviolet lithography. The lifetime of collection mirrors for extreme ultraviolet light in tin-based plasma light sources is limited considerably by…

We report on the modification of tin (Sn) film surfaces under a laser beam irradiation that triggers surface plasmon polariton (SPP) excitations. The observed surface features in the form of small raised grains, with well-defined rooting,…

We report the experimental observation of surface plasmon polariton (SPP) interference fringes with near-unity visibility and half-wavelength periodicity obtained in back reflection on a Bragg mirror. The presented method based on leakage…

We present the results of spectroscopic measurements in the extreme ultraviolet (EUV) regime (7-17 nm) of molten tin microdroplets illuminated by a high-intensity 3-J, 60-ns Nd:YAG laser pulse. The strong 13.5 nm emission from this…

Surface plasmon resonance (SPR) has been intensively investigated and widely exploited to trap the incident light and enhance absorption in the optoelectronic devices. The availability of graphene as a plasmonic material with strong…

Surface Plasmon Polaritons (SPP) are exploited due to their intriguing properties for photonic circuits fabrication and miniaturization, for surface enhanced spectroscopies and imaging beyond the diffraction limit. However, the excitation…

The interference patterns of the surface plasmon polaritons(SPPs) on the metal surface from a "point" source are observed. These interference patterns come from the forward SPPs and the reflected one from the obstacles, such as…

Solid deuterium (sD_2) is used as an efficient converter to produce ultracold neutrons (UCN). It is known that the sD_2 must be sufficiently cold, of high purity and mostly in its ortho-state in order to guarantee long lifetimes of UCN in…