基于脉冲力纳米光刻制备的多周期磁等离激元光栅
光学
2021-09-01 v1
摘要
我们提出一种基于脉冲力纳米光刻方法的磁等离激元纳米结构制备新技术。该方法可制造高质量磁等离激元纳米结构，其总损耗低于电子束光刻制备的光栅。该方法通过改变光栅参数(如刻划深度或单周期内刻痕数)来控制 SPP 激发效率。等离激元光栅的质量通过横向磁光克尔效应进行评估，该效应对等离激元结构的精细度极为敏感。
引用
@article{arxiv.2106.12289,
title = {Multiperiodic magnetoplasmonic gratings fabricated by the pulse force nanolithography},
author = {Savelii V. Lutsenko and Mikhail A. Kozhaev and Olga V. Borovkova and Andrey N. Kalish and Alexei G. Temiryazev and Sarkis A. Dagesyan and Vladimir N. Berzhansky and Alexander N. Shaposhnikov and Alexei N. Kuzmichev and Vladimir I. Belotelov},
journal= {arXiv preprint arXiv:2106.12289},
year = {2021}
}