SiC/Si(001) 界面失配位错的从头算研究
材料科学
2007-09-12 v1
摘要
采用经典分子动力学与从头算分子动力学相结合的方法,研究了高晶格失配的 SiC/Si(001) 界面。在分析的多种构型中,发现钉扎在界面处的位错网络是释放应变最有效的机制。文中详细描述了位错核心,并讨论了最稳定几何构型下的相关电子性质:我们发现隙中局域化的界面态可能是电子器件失效的根源。
引用
@article{arxiv.0709.1585,
title = {Ab initio Study of Misfit Dislocations at the SiC/Si(001) Interface},
author = {Giancarlo Cicero and Laurent Pizzagalli and Alessandra Catellani},
journal= {arXiv preprint arXiv:0709.1585},
year = {2007}
}
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