中文

A finite element analysis of a silicon based double quantum dot structure

量子物理 2007-05-23 v4

摘要

We present the results of a finite-element solution of the Laplace equation for the silicon-based trench-isolated double quantum-dot and the capacitively-coupled single-electron transistor device architecture. This system is a candidate for charge and spin-based quantum computation in the solid state, as demonstrated by recent coherent-charge oscillation experiments. Our key findings demonstrate control of the electric potential and electric field in the vicinity of the double quantum-dot by the electric potential applied to the in-plane gates. This constitutes a useful theoretical analysis of the silicon-based architecture for quantum information processing applications.

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引用

@article{arxiv.quant-ph/0512183,
  title  = {A finite element analysis of a silicon based double quantum dot structure},
  author = {S. Rahman and J. Gorman and C. H. W. Barnes and D. A. Williams and H. P. Langtangen},
  journal= {arXiv preprint arXiv:quant-ph/0512183},
  year   = {2007}
}