相关论文: The refined EUV mask model
Observations of the high-mass star forming region AFGL 2591 reveal a large abundance of CO+, a molecule known to be enhanced by far UV (FUV) and X-ray irradiation. In chemical models assuming a spherically symmetric envelope, the volume of…
The thickness of the lubricating film plays a vital role in the operational efficiency and reliability of rolling bearings. Ultrasonic reflection techniques offer a promising non-invasive approach for in situ evaluation of lubricant…
Ultraviolet absorption line spectroscopy is a sensitive diagnostic for the properties of interstellar and circumgalactic gas. Down-the-barrel observations, where the absorption is measured against the galaxy itself, are commonly used to…
Ultraviolet (UV) imagers are important for a variety of applications, such as quality inspection in the semiconductor industry, forensics and food quality inspection, but are often costly because they require dedicated semiconductor process…
To understand its evolution and the effects of its eruptive events, the Sun is permanently monitored by multiple satellite missions. The optically-thin emission of the solar plasma and the limited number of viewpoints make it challenging to…
Silicon photomultipliers are regarded as a very promising technology for next-generation, cutting-edge detectors for low-background experiments in particle physics. This work presents systematic reflectivity studies of Silicon…
The ultra-violet (UV) high-resolution spectropolarimeter Pollux is being studied in Europe under CNES leadership for the LUVOIR space mission. LUVOIR is a projected 15-m telescope equipped with a suite of instruments proposed to NASA.…
We derive periodic multilayer absorbers with effective uniaxial properties similar to perfectly matched layers (PML). This approximate representation of PML is based on the effective medium theory and we call it an effective medium PML…
Face presentation attacks have become a major threat to face recognition systems and many countermeasures have been proposed in the past decade. However, most of them are devoted to 2D face presentation attacks, rather than 3D face masks.…
Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigating damage caused by deposition of tin…
Deep Ultraviolet (DUV) Photolithography is currently used to fabricate mass-scale integrated circuits (ICs). Its high throughput and resolution could benefit large-scale RF MEMS production for the telecommunication market. We present a…
Photoevaporation driven by hydrogen-ionizing radiation, also known as extreme-ultraviolet (EUV), profoundly shapes the lives of diverse astrophysical objects. Focusing here mainly on the dispersal of protoplanetary disks, we construct an…
Collective lattice dynamics determine essential aspects of condensed matter, such as elastic and thermal properties. These exhibit strong dependence on the length-scale, reflecting the marked wavevector dependence of lattice excitations.…
Recent advances in the physical vapor deposition (PVD) of protective fluoride films have raised the far-ultraviolet (FUV: 912-1600 {\AA}) reflectivity of aluminum-based mirrors closer to the theoretical limit. The greatest gains, at more…
We present a model for the intensity of optically thin EUV emission for a plasma atmosphere. We apply our model to the solar corona as observed using the six optically thin EUV channels of the SDO/AIA instrument. The emissivity of the…
This paper presents a novel method, MaskMVS, to solve depth estimation for unstructured multi-view image-pose pairs. In the plane-sweep procedure, the depth planes are sampled by histogram matching that ensures covering the depth range of…
Accurate modeling of ultrasound wave propagation is essential for high-fidelity simulation and imaging in ultrasonic testing. A primary challenge lies in characterizing the excitation source, particularly for transducers with large…
Ultrafast accurate physical layer models are essential for designing, optimizing and managing ultrawideband optical transmission systems. We present a closed-form GN/EGN model based on a recent analytical breakthrough, improving…
Frequency-modulation (FM) spectroscopy has been extended to the vacuum-ultraviolet (VUV) range of the electromagnetic spectrum. Coherent VUV laser radiation is produced by resonance-enhanced sum-frequency mixing…
We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a…