相关论文: The refined EUV mask model

Extreme ultraviolet (EUV) lithography has revolutionized high-volume manufacturing of nanoscale components, enabling the production of smaller, denser, and more energy efficient integrated circuit devices. Yet, the use of EUV light results…

Extreme ultraviolet (EUV) scatterometry is an increasingly important metrology that can measure critical parameters of periodic nanostructured materials in a fast, accurate, and repeatable manner and with high sensitivity to nanoscale…

We present a theoretical evaluation of radiation dose constraints for extreme ultraviolet (EUV) and soft X-ray microscopy. Our work particularly addresses the long-standing concern regarding strong absorption of EUV radiation in biological…

This paper discusses a simple, low-cost, highly efficient two-mirror projector with a simplified illumination system. The EUV source power can be reduced by 1/10 compared to the current six-mirror EUV projector system. The required EUV…

We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400\degree C. Images obtained by scanning transmission…

High-resolution extreme ultraviolet (XUV) imaging remains limited by conventional approaches that require complex optics such as multilayer mirrors and zone plates. These methods are expensive, suffer from chromatic aberrations and narrow…

The design and fabrication of a metal-dielectric-metal absorber that achieves strong absorption from the ultraviolet (UV) to the near-infrared (near-IR) spectrum are presented. The proposed nanostructure consists of a periodic titanium (Ti)…

The loss of STEREO-B in 2014 created a persistent blind spot in Extreme Ultraviolet (EUV) imaging of the solar farside. We present HelioFill, to the authors' knowledge, the first denoising-diffusion inpainting model that restores full-Sun…

An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…

Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…

Future observatories utilizing reflection grating spectrometers for extreme ultraviolet (EUV) and soft X-ray (SXR) spectroscopy require high-fidelity gratings with both blazed groove facets and custom groove layouts that are often fanned or…

Mask-based lensless imagers use simple optics and computational reconstruction to design compact form factor cameras with compressive imaging ability. However, these imagers generally suffer from poor reconstruction quality. Here, we…

An admittedly pedantic but hopefully useful and informative analysis is presented of the EUVE 70--180 Angstrom spectra of nine polars. These spectra are fit with three different models---a blackbody, a pure-H stellar atmosphere, and a solar…

The High Resolution Imager (HRI_EUV) telescope of the Extreme Ultraviolet Imager (EUI) instrument onboard Solar Orbiter has observed EUV brightenings, so-called campfires, as fine-scale structures at coronal temperatures. The goal of this…

The possibility to obtain a three-dimensional representation of a single object with sub-$\mu$m resolution is crucial in many fields, from material science to clinical diagnostics. This is typically achieved through tomography, which…

A custom, flat field, extreme ultraviolet EUV spectrometer built specifically for use with low power light sources that operate under ultrahigh vacuum conditions is reported. The spectral range of the spectrometer extends from 4 nm to 40…

Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (LEEs) produced upon illumination of resist materials with…

The freedom of design of coded masks used by mask-based lensless cameras is an advantage these systems have when compared to lens-based ones. We leverage this freedom of design to propose a shape-preserving optimization scheme for a…

A reflection model with three components, a specular spike, a specular lobe and a diffuse lobe is discussed. This model was successfully applied to describe reflection of xenon scintillation light (175 nm) by PTFE and other fluoropolymers…

Nanocrystalline textured EuO thin films are prepared by an oxygen loss process from a pure Eu2O3 bulk ceramic target through pulsed laser deposition in vacuum at room temperature. X-ray diffraction spectra evidence a well-defined…