相关论文: Si Orientation Dependent Release of SiO2 Microcant…
A new method of introducing nanopores with spongy morphology during fabrication of size and pitch controlled flexible silicon microwires (SiMWs) in wafer scale is presented using nanosphere lithography technique in addition to metal…
Recently-demonstrated high-quality three-dimensional (3D) subsurface laser processing inside crystalline silicon (c-Si) wafers opens a door to a wide range of novel applications in multidisciplinary research areas. Using this technique, a…
We demonstrate a mechanochemical approach to fabrication of a bidirectional surface on a doped silicon wafer. In the initial step of our fabrication procedure, a high-density polyethylene (HDPE) stylus is pressed and drawn on the Si…
A comparison of porous structures formed from silicon (Si) wafers with different resistivities has been reported here based on the morphological studies carried out using scanning electron microscope (SEM). The porous Si samples have been…
This work reports an original method for the fabrication of Metal-Isulator-Semiconductor (MIS) structures with silicon nanocrystals (Si NCs) based active layers embedded in the insulating SiO 2 oxide, for high performance solar cell and…
Micro-Raman scattering and electron field emission characteristics of silicon nanowires (SiNWs) synthesized by metal assisted chemical etching (MACE) are investigated. Scanning electron microscopy images reveal the growth of well aligned…
Methanol masers are often found in linear distributions, and it has been hypothesized that these masers are tracing circumstellar accretion disks around young massive stars. However, recent observations in H2 emission have shown what appear…
The silicon/silicon dioxide (Si/SiO2) interface plays a crucial role in the performance, cost, and reliability of most modern microelectronic devices, from the basic transistor to flash memory, digital cameras, and solar cells. Today the…
The Y2SiO5 (YSO) crystal is a dielectric material with biaxial anisotropy with known values of refractive index at optical frequencies. It is a well-known rare-earth (RE) host material for optical research and more recently has shown…
Anisotropic etching is a widely used process in semiconductor manufacturing, in particular for micro- and nano-scale texturing of silicon surfaces for black silicon production. The typical process of plasma-assisted etching uses energetic…
Non-linear absorption phenomena induced by controlled irradiation with a femtosecond laser beam can be used to tailor materials properties within the bulk of substrates. One of the most successful applications of this technique is the…
Stoichiometric silicon nitride has emerged as a widely used integrated photonic material owing to its high index of refraction, nonlinear optical properties, and broad transparency window spanning visible to mid-IR frequencies. However,…
At vertical edges, thin films of silicon oxide (SiO_{2-x}) contain semiconductive c-Si layered nanocrystals (Si NC) embedded in and supported by an insulating g-SiO2 matrix. Tour et al. have shown that a trenched thin film geometry enables…
We describe a micro-fabrication method to create concave features with ultra-low surface roughness in silica, either on the end facets of optical fibers or on flat substrates. The machining uses a single focused CO2 laser pulse. Parameters…
We report on the design, fabrication, and implementation of ultrasensitive micromechanical oscillators. Our ultrathin single-crystal silicon cantilevers with integrated magnetic structures are the first of their kind: They are fabricated…
Controlling light emission from quantum emitters has important applications ranging from solid-state lighting and displays to nanoscale single-photon sources. Optical antennas have emerged as promising tools to achieve such control right at…
We report a successful synthesis of monodisperse L10-FePt nanocrystals which are not only superior in magnetism but also easy to handle through being dispersible in solvents. Thanks to a thick SiO2-coating, the thermal treatment needed to…
Nowadays, silicon micro-cantilevers with different geometrical shapes are widely used as micro-electro-mechanical systems and, more recently, as force sensor probes in atomic force microscopy (AFM). During the last ten years, several…
For future nanoelectronic devices - such as room-temperature single electron transistors - the site-controlled formation of single Si nanocrystals (NCs) is a crucial prerequisite. Here, we report an approach to fabricate single Si NCs via…
Mesa- and trench-patterned surfaces of 4H-SiC(0001) 4{\textdegree}off wafers were structured in macrosteps using Si melting in a SiC-Si-SiC sandwich configuration. Si spreading difficulties were observed in the case of trench-patterned…