相关论文: A Review of Proximity Effect Correction in Electro…
Electron ptychography describes a family of algorithms which are used to enable the reconstruction of complex specimen transmission functions of a sample in order to obtain both phase and amplitude information, as applied within the realms…
Shadow X-ray Magnetic Circular Dichroism Photo-Emission Electron Microscopy (XMCD-PEEM) is a recent technique, in which the photon intensity in the shadow of an object lying on a surface, may be used to gather information about the…
Effects of electron-beam processing on the structure and mechanical properties of poly-ether-ether ketone (PEEK) were studied by XRD and tribological tests. An ambiguous change in the mechanical properties of the irradiated samples was…
Ptychography, a form of Coherent Diffractive Imaging, is used with short wavelengths (e.g. X-rays, electron beams) to achieve high-resolution image reconstructions. One of the limiting factors for the reconstruction quality is the accurate…
The changes of surface structure, induced by electron beam irradiation (EBI) on the surface of poly(aryl-ether-ether-ketone) (PEEK), were investigated by using a range of various experimental techniques, such as tribology, Raman, AFM, NMR,…
The implementation of aberration-corrected electron beam lithography (AC-EBL) in a 200 keV scanning transmission electron microscope (STEM) is a novel technique that could be used for the fabrication of quantum devices based on 2D atomic…
Electron-beam (e-beam) lithography is widely employed in fabrication of 2-D patterns and 3-D structures. A certain type or shape of the sidewall in the remaining resist profile may be desired in an application, e.g., an undercut for…
Polarized lepton beams are an important aspect in the design of the future 100 km-scale Circular Electron-Positron Collider (CEPC). Precision beam energy calibration using resonant depolarization, as well as longitudinally polarized…
We study the impact of optical field-enhancement effects on the optoelectronic properties of metal nanoparticle arrays. Applying a focused ion beam lithography in combination with an electron beam deposition technique we can pattern…
The study of ep-scattering at LEP x LHC offers an interesting opportunity to search for additional heavy neutral gauge bosons. We study the influence of radiative corrections, especially of the potentially large QED contributions, to the…
The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structure of ferroelectric materials is reviewed. Electron optics in both…
Programmable electron-beam scanning offers new opportunities to improve dose efficiency and suppress scan-induced artifacts in scanning transmission electron microscopy. Here, we systematically benchmark the impact of non-raster…
Precession electron diffraction has in the past few decades become a powerful technique for structure solving, strain analysis, and orientation mapping, to name a few. One of the benefits of precessing the electron beam, is increased…
In computer vision, correcting the exposure level is a fundamental task for enhancing the visual quality of observations with inappropriate lightness. However, existing methodologies tend to be impractical because they lack adaptability to…
We review two commonly used approximate treatments of beamstrahlung at lepton colliders. We discuss the applicability of those approximations and show that they are bound to fail at very high energy $e^+e^-$ colliders such as CLIC. We model…
In a scanning transmission electron microscope (STEM), producing a high-resolution image generally requires an electron beam focused to the smallest point possible. However, the magnetic lenses used to focus the beam are unavoidably…
The Perfect Electric Conductor (PEC) mirror phase corrector plays an important role in the beam-shaping mirror system design for Quasi-Optical (QO) mode converter (launcher) in the sub-THz high-power gyrotron. In this article, both the…
We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive structures in the sub-100nm regime. The devices were…
The interaction between free electrons and optical near fields is attracting increasing attention as a way to manipulate the electron wave function in space, time, and energy. Relying on currently attainable experimental capabilities, we…
Precise alignment of the electron beam is critical for successful application of scanning transmission electron microscopes (STEM) to understanding materials at atomic level. Despite the success of aberration correctors, aberration…