The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structure of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented.
@article{arxiv.1806.04849,
title = {Full field electron spectromicroscopy applied to ferroelectric materials},
author = {N. Barrett and J. E. Rault and J. L. Wang and C. Mathieu and A. Locatelli and T. O. Mentes and M. A. Nino and S. Fusil and M. Bibes and A. Barthelemy and D. Sando and W. Ren and S. Prosandeev and L. Bellaiche and B. Vilquin and A. Petraru and I. P. Krug and C. M. Schneider},
journal= {arXiv preprint arXiv:1806.04849},
year = {2018}
}