相关论文: Lithography Hotspot Detection and Mitigation in Na…
As technology scaling is approaching the physical limit, lithography hotspot detection has become an essential task in design for manufacturability. While the deployment of pattern matching or machine learning in hotspot detection can help…
Layout hotpot detection is one of the main steps in modern VLSI design. A typical hotspot detection flow is extremely time consuming due to the computationally expensive mask optimization and lithographic simulation. Recent researches try…
Recent advances in VLSI fabrication technology have led to die shrinkage and increased layout density, creating an urgent demand for advanced hotspot detection techniques. However, by taking an object detection network as the backbone,…
At advanced process nodes, pattern matching techniques have been used in the detection of lithography hotspots, which can affect yields of manufactured integrated circuits. Although commercial pattern matching and in-design hotspot fixing…
Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models are computationally expensive and slow, even when equipped…
Machine learning-based lithography hotspot detection has been deeply studied recently, from varies feature extraction techniques to efficient learning models. It has been observed that such machine learning-based frameworks are providing…
Continuous technology scaling and the introduction of advanced technology nodes in Integrated Circuit (IC) fabrication is constantly exposing new manufacturability issues. One such issue, stemming from complex interaction between design and…
Hotspot detection using thermal imaging has recently become essential in several industrial applications, such as security applications, health applications, and equipment monitoring applications. Hotspot detection is of utmost importance…
In computer chip manufacturing, the study of etch patterns on silicon wafers, or metrology, occurs on the nano-scale and is therefore subject to large variation from small, yet significant, perturbations in the manufacturing environment. An…
Characterizing materials using electron micrographs is crucial in areas such as semiconductors and quantum materials. Traditional classification methods falter due to the intricatestructures of these micrographs. This study introduces an…
At advanced process nodes, lithography weakpoints can exist in physical layouts of integrated circuit designs even if the layouts pass design rule checking (DRC). Existence of lithography weakpoints in a physical layout can cause…
The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning…
High-density LED arrays enable high-speed transmission in image-sensor-based visible-light communication (VLC) systems. However, when optical spots become blurred and spatially overlapped due to focal shift, resolution limitations, or…
Locimetric authentication is a form of graphical authentication in which users validate their identity by selecting predetermined points on a predetermined image. Its primary advantage over the ubiquitous text-based approach stems from…
In semiconductor manufacturing, lithography has often been the manufacturing step defining the smallest possible pattern dimensions. In recent years, progress has been made towards high-NA (Numerical Aperture) EUVL…
Metasurfaces enable precise control over the properties of light and hold promise for commercial applications. However, fabricating visible metasurfaces suitable for high-volume production is challenging and requires scalable processes.…
High-resolution lithographic techniques are often limited by low volumetric throughput, since there is no universal and scalable manufacturing process that can produce 3D metasurfaces. In this work, we demonstrate a high-speed holographic…
Digital holographic microscopy is a powerful tool for characterizing transparent and reflective phase objects. Its ability to reconstruct amplitude and phase can also offer great insight into wavefront shaping and design of all-dielectric…
Miniaturizing nonlinear optical components is essential for integrating advanced light manipulation into compact photonic devices, enabling scalable and cost-effective applications. While monocrystalline lithium niobate thin films advance…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…