相关论文: E-BLOW: E-Beam Lithography Overlapping aware Stenc…
Conventional lithography methods involving pattern transfer through resist templating face challenges of material compatibility with various process solvents. Other approaches of direct material writing often compromise pattern complexity…
As the feature size of semiconductor process further scales to sub-16nm technology node, triple patterning lithography (TPL) has been regarded one of the most promising lithography candidates. M1 and contact layers, which are usually…
The pursuit of green methodologies for fabricating optoelectronic devices necessitates the adoption of self-assembly-based strategies to engineer efficient and sustainable platforms. Microbubble lithography (MBL) stands out as a directed…
Neural network accelerators with low latency and low energy consumption are desirable for edge computing. To create such accelerators, we propose a design flow for accelerating the extremely low bit-width neural network (ELB-NN) in embedded…
Electromagnetic (EM) imaging is an important tool for non-invasive sensing with low-cost and portable devices. One emerging application is EM stroke imaging, which enables early diagnosis and continuous monitoring of brain strokes.…
Image steganography is the art of hiding secret message in grayscale or color images. Easy detection of secret message for any state-of-art image steganography can break the stego system. To prevent the breakdown of the stego system data is…
Minimal Boltzmann kinetic models, such as lattice Boltzmann, are often used as an alternative to the discretization of the Navier-Stokes equations for hydrodynamic simulations. Recently, it was argued that modeling sub-grid scale phenomena…
Electron backscatter diffraction (EBSD) is a technique used to measure crystallographic features in the scanning electron microscope. The technique is highly automated and readily accessible in many laboratories. EBSD pattern indexing is…
The three scanning electron microscope diffraction based techniques of electron channelling patterns (ECPs), electron channelling contrast imaging (ECCI), and electron back scatter diffraction (EBSD) are reviewed. The dynamical diffraction…
In the realm of lithography, Optical Proximity Correction (OPC) is a crucial resolution enhancement technique that optimizes the transmission function of photomasks on a pixel-based to effectively counter Optical Proximity Effects (OPE).…
The paper presents an novel electric triple layer(ETL) model as an improved model of electrical double layer(EDL) to predict electroosmosis flow rate on the electrode surface at low frequency. The predicted slip velocity based on classical…
The paper presents an novel electric triple layer(ETL) model as an improved model of electrical double layer(EDL) to predict electroosmosis flow rate on the electrode surface at low frequency. The predicted slip velocity based on classical…
Gratings enable dispersive spectroscopy from the X-ray to the optical, and feature prominently in proposed flagships and SmallSats alike. The exacting performance requirements of these future missions necessitate assessing whether the…
Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has become an important objective in the field of computational…
Query clustering organizes queries into groups that reflect shared latent capability demands, enabling capability-aware LLM evaluation. Existing clustering methods, which primarily rely on semantic taxonomies or embeddings, often fail to…
Modern electron linear accelerators are often designed to produce smooth bunch distributions characterized by their macroscopic ensemble-average moments. However, an increasing number of accelerator applications call for finer control over…
We present an analytical scheme for the design of realistic metagratings for wide-angle engineered reflection. These recently proposed planar structures can reflect an incident plane wave into a prescribed (generally non-specular) angle…
Network slicing over space division multiplexed elastic optical networks (SDM EONs) enables efficient multiservice provisioning on a shared optical substrate. However, embedding such slices requires coordinated spectrum and compute resource…
The increase in demand for scalable and energy efficient artificial neural networks has put the focus on novel hardware solutions. Integrated photonics offers a compact, parallel and ultra-fast information processing platform, specially…
The occlusion problem remains a crucial challenge in optical flow estimation (OFE). Despite the recent significant progress brought about by deep learning, most existing deep learning OFE methods still struggle to handle occlusions; in…