A microfabricated surface-electrode ion trap in silicon
摘要
The prospect of building a quantum information processor underlies many recent advances ion trap fabrication techniques. Potentially, a quantum computer could be constructed from a large array of interconnected ion traps. We report on a micrometer-scale ion trap, fabricated from bulk silicon using micro-electromechanical systems (MEMS) techniques. The trap geometry is relatively simple in that the electrodes lie in a single plane beneath the ions. In such a trap we confine laser-cooled 24Mg+ ions approximately 40 microns above the surface. The fabrication technique and planar electrode geometry together make this approach amenable to scaling up to large trap arrays. In addition we observe that little laser cooling light is scattered by the electrodes.
引用
@article{arxiv.quant-ph/0605170,
title = {A microfabricated surface-electrode ion trap in silicon},
author = {J. Britton and D. Leibfried and J. Beall and R. B. Blakestad and J. J. Bollinger and J. Chiaverini and R. J. Epstein and J. D. Jost and D. Kielpinski and C. Langer and R. Ozeri and R. Reichle and S. Seidelin and N. Shiga and J. H. Wesenberg and D. J. Wineland},
journal= {arXiv preprint arXiv:quant-ph/0605170},
year = {2007}
}
备注
4 pages, 6 figures