Related papers: High-NA In-Line Projector for EUV Lithography
Laser cutting of semiconductor wafers and transparent dielectrics has become a dominant process in manufacturing industries, encompassing a wide range of applications from flat display panels to microelectronic chips. Limited by the…
Nanoscale control of optical dispersion is essential for applications ranging from miniaturized spectrometers to color printing, all of which demand broadband spectral tunability. However, the Kramers-Kronig relations impose a fundamental…
Nonlinear optical (NLO) imaging platforms traditionally rely on refractive microscope objectives, which suffer from chromatic aberrations and temporal dispersion of pulsed excitation light. These issues degrade spatial imaging properties…
A novel technique is reported to improve the resolution of two-photon direct laser writing lithography. Thanks to the high collimation enabled by extraordinary $\varepsilon_{NZ}$ (near-zero) metamaterial features, ultra-thin dielectric…
The utilization of a 6.5m monolithic primary mirror in a compact three-mirror anastigmat (TMA) telescope design offers unprecedented capabilities to accommodate various next generation science instruments. This design enables the rapid and…
Optical metasurfaces performing analog image processing - such as spatial differentiation and edge detection - hold the potential to reduce processing times and power consumption, while avoiding bulky 4F lens systems. However, current…
Nanostructuring hard optical crystals has so far been exclusively feasible at their surface, as stress induced crack formation and propagation has rendered high precision volume processes ineffective. We show that the inner chemical etching…
This paper proposes a non-computational method of counteracting the effect of image degradation introduced by the diffraction phenomenon in lensless microscopy. All the optical images (whether focused by lenses or not) are diffraction…
We develop and demonstrate two numerical methods for solving the class of open cavity problems which involve a curved, cylindrically symmetric conducting mirror facing a planar dielectric stack. Such dome-shaped cavities are useful due to…
We consider using toroidal curved detectors to improve the performance of imaging optical systems. We demonstrate that some optical systems have an anamorphic field curvature. We consider an unobscured re-imaging three-mirror anastigmat as…
Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigating damage caused by deposition of tin…
Dynamic scattering and imaging with coherent, ultrafast, extreme ultraviolet (EUV) light sources can resolve charge, phonon and spin processes on their intrinsic length and time scales. However, full field coherent diffraction imaging…
Next-generation nano and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition.…
Metasurfaces enable precise control over the properties of light and hold promise for commercial applications. However, fabricating visible metasurfaces suitable for high-volume production is challenging and requires scalable processes.…
High precision, high numerical aperture mirrors are desirable for mediating strong atom-light coupling in quantum optics applications and can also serve as important reference surfaces for optical metrology. In this work we demonstrate the…
We present the development of Linear Astigmatism Free - Three Mirror System (LAF-TMS). This is a prototype of an off-axis telescope that enables very wide field of view (FoV) infrared satellites that can observe Paschen-$\alpha$ emission,…
Silicon nanostructuring imparts unique material properties including antireflectivity, antifogging, anti-icing, self-cleaning, and/or antimicrobial activity. To tune these properties however, a good control over features size and shape is…
The last decade has seen numerous efforts to achieve imaging resolution beyond that of the Abbe-Rayleigh diffraction limit. The main direction of research aiming to break this limit seeks to exploit the evanescent components containing fine…
We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by use of standard industrial high throughput silicon processing techniques: UV Nano Imprint Lithography (UV-NIL) combined with continuous Reactive…
Table-top extreme ultraviolet (EUV) microscopy offers unique opportunities for label-free investigation of biological samples. Here, we demonstrate ptychographic EUV imaging of two dried, unstained model specimens: germlings of a fungus…