Related papers: High-NA In-Line Projector for EUV Lithography
Volumetric lithography offers a path to scalable fabrication of complex three-dimensional (3D) micro- and nanoscale architectures, yet existing approaches are limited by quasi-two-dimensional exposure physics or slow serial writing. We…
We present yet another new family of masks for high-contrast imaging as required for the to-be-built terrestrial planet finder space telescope. The ``best'' design involves a square entrance pupil having a 4-vane spider, a square…
High-resolution patterning of periodic structures over large areas has several applications in science and technology. One such method, based on the long-known Talbot effect observed with diffraction gratings, is achromatic Talbot…
Tunable coherent light sources operating in the vacuum ultraviolet (VUV) region in 100-200-nm (6-12 eV) wavelength range have important spectroscopic applications in many research fields, including time-resolved angle-resolved photoemission…
Frequency upconversion technique offers an appealing approach for sensitive mid-infrared (MIR) imaging at room temperature. However, the spatial resolution of the upconversion imager has been notoriously restricted by the limited transverse…
Integration of complex photonic structures onto optical fiber facets enables powerful platforms with unprecedented optical functionalities. Conventional nanofabrication technologies, however, do not permit viable integration of complex…
Light emitting diodes (LEDs) in the deep ultra-violet (DUV) offer new perspectives for multiple applications ranging from 3D printing to sterilization. However, insufficient light extraction severely limits their efficiency. Nanostructured…
Ptychography has become prominent at synchrotron facilities worldwide for characterizing biological and material specimens' topological structures and properties at the nanometer or atomic scale, due to its lens - less, highly quantitative…
Self-diffraction is a non-collinear four-wave mixing technique well-known in optics. We explore self-diffraction in the extreme ultraviolet (EUV) range, taking advantage of intense femtosecond EUV pulses produced by a free electron laser.…
Multilayer metasurfaces provide substantially greater spectral design freedom than single-layer devices, yet their implementation in the visible and near-infrared remains limited by the complexity, cost, and low throughput of conventional…
High-resolution extreme ultraviolet (XUV) imaging remains limited by conventional approaches that require complex optics such as multilayer mirrors and zone plates. These methods are expensive, suffer from chromatic aberrations and narrow…
We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive structures in the sub-100nm regime. The devices were…
Ultraviolet (UV) imagers are important for a variety of applications, such as quality inspection in the semiconductor industry, forensics and food quality inspection, but are often costly because they require dedicated semiconductor process…
Periodic or gradient subwavelength structures are basic configurations of photonic crystals and metamaterials. While the numerical simulations predict trivial loss, but the fabricated photonic crystal waveguides by E-beam lithography and…
The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3…
To address the major challenges to obtain high spatial resolution in snapshot hyperspectral imaging, 3D printed glass lightguide array has been developed to sample the intermediate image in high spatial resolution and redistribute the…
We have designed, built, and characterized a high-resolution objective lens that is compatible with an ultra-high vacuum environment. The lens system exploits the principle of the Weierstrass-sphere solid immersion lens to reach a numerical…
The present paper describes the current baseline optical design of POLLUX, a high-resolution spectropolarimeter for the future LUVOIR mission. The instrument will operate in the ultraviolet (UV) domain from 90 to 390 nm in both…
Flat optics consisting of nanostructures of high-refractive-index materials produce lenses with thin form factors that tend to operate only at specific wavelengths. Recent attempts to achieve achromatic lenses uncover a trade-off between…
We describe a two-beam interference structured illumination fluorescence microscope. The novelty of the presented system lies in its simplicity. A programmable electro-optical spatial light modulator in an intermediate image plane enables…