Related papers: High-NA In-Line Projector for EUV Lithography
3D printing allows rapid fabrication of complex objects from digital designs. One 3D-printing process, direct laser writing, polymerises a light-sensitive material by steering a focused laser beam through the shape of the object to be…
With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer,…
In this article, we introduce the concept of a dielectric nanolaser that is nanoscopic in all spatial dimensions. Our proposal is based on dielectric nanoparticles of high refractive index, e.g., silicon, acting as a (passive) cavity…
We demonstrate a high-NA (0.88), ultra-low-f-number (f/0.2714), multi-wavelength (480nm, 550nm and 650nm) multilevel diffractive MicroLens Array (MLA) using inverse design. Each microlens in the array is close-packed with diameter of 70…
High-numerical-aperture (NA) oblique plane microscopy enables noninvasive fluorescence imaging of subcellular dynamics without requiring radical sample modification. However, performance degrades at depth in multicellular specimens as…
We present a broadband and polarization-insensitive unidirectional imager that operates at the visible part of the spectrum, where image formation occurs in one direction while in the opposite direction, it is blocked. This approach is…
A new optical design concept of telescopes to provide an aberration-free, wide field, unvignetted flat focal plane is described. The system employs three aspheric mirrors to remove aberrations, and provides a semi-circular field of view…
High throughput optical system is defined to possess the features of both large field of view (FOV) and high resolution. However, it is full of challenge to design such a telescope with the two conflicting specifications at the same time.…
Sub-wavelength resolution imaging requires high numerical aperture (NA) lenses, which are bulky and expensive. Metasurfaces allow the miniaturization of conventional refractive optics into planar structures. We show that high-aspect-ratio…
The numerical aperture (NA) of a lens determines its ability to focus light and its resolving capability. Having a large NA is a very desirable quality for applications requiring small light-matter interaction volumes or large angular…
Meta-optics, the application of metasurfaces into optical systems, is seeing an accelerating development owing to advantages in size, weight and cost and the ability to program optical functions beyond traditional refractive optics. The…
We propose a novel solution for volumetric ultrasound imaging using single-side access 3-D synthetic-aperture scanning of a clinical linear array. This solution is based on an advanced scanning geometry and a software-based ultrasound…
A simple and effective method to fabricate a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling a printing gap…
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors…
Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer…
In this paper we analyze and compare approaches for 3D reconstruction from low-resolution (250x250), high radial distortion stereo images, which are acquired with small baseline (approximately 1mm). These images are acquired with the system…
Three-dimensional (3D) nano-printing via two-photon polymerization offers unparalleled design flexibility and precision, thereby enabling rapid prototyping of advanced micro-optical elements and systems, including hybrid achromats,…
Edge-enhanced imaging is critical for visualizing weakly absorbing and transparent objects. Extending this functionality into the mid-infrared (MIR) region enables chemical sensitivity and improved imaging performance for biomedical,…
Developing a suitable production method for three-dimensional periodic nanostructures with high aspect ratios is a subject of growing interest. For mass production, Talbot lithography offers many advantages. However, one disadvantage is…
Extreme ultraviolet (EUV) scatterometry is an increasingly important metrology that can measure critical parameters of periodic nanostructured materials in a fast, accurate, and repeatable manner and with high sensitivity to nanoscale…