Multilayer Q-BIC-like Optical Filters with High Throughput Direct-Write Multilayer Lithography

Multilayer metasurfaces provide substantially greater spectral design freedom than single-layer devices, yet their implementation in the visible and near-infrared remains limited by the complexity, cost, and low throughput of conventional nanofabrication. Here, we establish a recently proposed direct-write electron-beam lithography approach as a high-throughput fabrication platform for multilayer resonant metasurfaces, based on an antimony precursor that decomposes in situ into high-index antimony sulfide. This method eliminates deposition-etch cycles and reduces each layer to only two fabrication steps, enabling efficient realization of multilayer architectures. Using this platform, we demonstrate multilayer q-BIC-derived metasurfaces with independently tunable resonance wavelengths and linewidths, allowing the construction of compact multi-resonant filters with spectrally decoupled layers. We experimentally demonstrate three-layer devices supporting three resonances and show independent control of resonance wavelength and Q factor across layers. Leveraging this capability, we generate decorrelated filter arrays for compressive sensing and hyperspectral reconstruction, achieving sets of 9 and 36 filters with average absolute Pearson correlation coefficients of 0.11 and 0.21, surpassing prior metasurface and photonic-crystal implementations. These results establish a practical route toward scalable multilayer resonant metasurfaces for spectral filtering, on-chip spectroscopy, and computational imaging.