Direct and High-Throughput Fabrication of Mie-Resonant Metasurfaces via Single-Pulse Laser Interference
Abstract
High-index dielectric metasurfaces featuring Mie-type electric and magnetic resonances have been of a great interest in a variety of applications such as imaging, sensing, photovoltaics and others, which led to the necessity of an efficient large-scale fabrication technique. To address this, here we demonstrate the use of single-pulse laser interference for direct patterning of an amorphous silicon film into an array of Mie resonators. The proposed technique is based on laser-interference-induced dewetting. A precise control of the laser pulse energy enables the fabrication of ordered dielectric metasurfaces in areas spanning tens of micrometers and consisting of thousands of hemispherical nanoparticles with a single laser shot. The fabricated nanoparticles exhibit a wavelength-dependent optical response with a strong electric dipole signature. Variation of the pre-deposited silicon film thickness allows tailoring of the resonances in the targeted visible and infrared spectral ranges. Such direct and high-throughput fabrication paves the way towards a simple realization of spatially invariant metasurface-based devices.
Keywords
Cite
@article{arxiv.2003.03457,
title = {Direct and High-Throughput Fabrication of Mie-Resonant Metasurfaces via Single-Pulse Laser Interference},
author = {Jonas Berzinš and Simonas Indrišiūnas and Koen van Erve and Arvind Nagarajan and Stefan Fasold and Michael Steinert and Giampiero Gerini and Paulius Gečys and Thomas Pertsch and Stefan M. B. Bäumer and Frank Setzpfandt},
journal= {arXiv preprint arXiv:2003.03457},
year = {2020}
}